Localized deposition of hydrocarbon using plasma activated chemical vapour deposition

Abhinandan, Lala; Holländer, Andreas

doi:10.1016/j.tsf.2003.10.014

Cited by 12 publications

(14 citation statements)

References 5 publications

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“…The melting point of this oxide being much lower than that of the metal, the surface is liquid and evaporates, producing One important issue raised by these works deals with the influence that the residence time of the precursor from the end of the capillary to the substrate exerts on the characteristics of the deposit. This issue resonates with the question raised by the works of Höllander et al [109,116,117]. These authors developed a process based on a similar idea, even though it was scaled to operate under low-pressure (0.2-2 mbar).…”

Section: Localized Pecvdmentioning

confidence: 88%

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Nanoscience with non-equilibrium plasmas at atmospheric pressure

Belmonte¹,

Arnoult²,

Henrion³

et al. 2011

J. Phys. D: Appl. Phys.

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This review devoted to nanoscience with atmospheric pressure plasmas shows how nanomaterials are synthesised locally using three main ways: localized PECVD, nanoparticles and templates. On the other hand, self-organization of nano-objects on surfaces is driven by electric fields, stress and high temperatures. We show that the specificities of plasmas at high pressure, as their small size, their self-organization or their filamentation have been little exploited in the synthesis of nanomaterials. Finally, perspectives in the field are given.

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Section: Localized Pecvdmentioning

confidence: 88%

“…On the one hand, studies on PECVD from micro-discharges are carried out in Japan by Ito et al [46,47,69,[113][114][115]. On the other hand, works on PECVD under vacuum using capillary are performed by Hollander et al [109,116,117]. These latter authors formalize the concept of localized PECVD.…”

Section: Localized Pecvdmentioning

confidence: 99%

Nanoscience with non-equilibrium plasmas at atmospheric pressure

Belmonte¹,

Arnoult²,

Henrion³

et al. 2011

J. Phys. D: Appl. Phys.

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“…An argon flow from cylinder (1) through a gas flow control valve is fed into a container (2) with the liquid hydro carbon, placed in a thermostat (3). Argon is saturated with benzene vapor by its bubbling through a layer of liquid benzene, and then the vapor-gas mixture gets into a reactor (4). The plasma reactor has a planar arrangement of the electrodes.…”

Section: Methodsmentioning

confidence: 99%

“…[2]. LMs are manufactured primarily from gaseous hydrocarbons and organosili con compounds [3][4][5] or by deposition of nanoparti cles [6]. There are no published data on the prepara tion of LMs from vaporized liquid hydrocarbons.…”

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confidence: 99%

Localized growth of materials from amorphous hydrogenated carbon by barrier-discharge treatment of benzene vapor-argon mixture

2013

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The possibility of a localized growth of materials from amorphous hydrogenated carbon by the barrier discharge treatment of a benzene vapor mixture with argon has been shown. Two types of material are produced, the "columnar" black entities of ~100 µm in diameter and 2 mm in height and the "polymeric pat terns" as "honeycombs" of ~ 4-6 mm diameter with a clearly defined boundary in the form of the "swell" as high as 100 µm. The structure and composition of the materials and their growth kinetics have been investi gated.

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“…Deposition, as usually understood in CVD, normally produces thin films in two dimensions, the third one being their thickness which is very much smaller. It becomes localized when the dimensionality of the deposited coating is zero dimensional, i.e., a dot on the surface of a substrate (Ref [46][47][48]. Reducing dimensions led to micro-CVD, i.e., deposition area below 1 mm 2 .…”

Section: Introductionmentioning

confidence: 99%