2007
DOI: 10.1016/j.ijheatfluidflow.2006.05.010
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Locally heated shear-driven liquid films in microchannels and minichannels

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Cited by 104 publications
(54 citation statements)
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“…The record value of the critical heat flux of 1.2 kW/cm 2 was achieved in experiments ( Figure 3, point Rel = 193, USg = 71.3 m/s). This critical heat flux for the water film flowing under the action of gas was achieved for the mass water flow rate of 175 kg/m 2 s. At that, as it is shown in [11], the critical heat flux for subcooled water flow boiling in a minichannel (at the same mass flow rate of liquid, at atmospheric pressure and subcooling to the saturation temperature of 75 K) reaches 170 W/cm 2 (Fig. 3, line 8).…”
Section: Resultsmentioning
confidence: 66%
See 1 more Smart Citation
“…The record value of the critical heat flux of 1.2 kW/cm 2 was achieved in experiments ( Figure 3, point Rel = 193, USg = 71.3 m/s). This critical heat flux for the water film flowing under the action of gas was achieved for the mass water flow rate of 175 kg/m 2 s. At that, as it is shown in [11], the critical heat flux for subcooled water flow boiling in a minichannel (at the same mass flow rate of liquid, at atmospheric pressure and subcooling to the saturation temperature of 75 K) reaches 170 W/cm 2 (Fig. 3, line 8).…”
Section: Resultsmentioning
confidence: 66%
“…Thin and ultra-thin (less than 10 µm in thickness) liquid films, moving under the action of a forced gas flow in a mini-channel, are promising for the use in the temperature control systems of modern semiconductor devices [2]. The numerical and analytical studies of the heat and mass transfer processes and hydrodynamics of joint motion of intensively evaporating liquid film and gas flow in a mini-channel have been performed in [3][4].…”
Section: Introductionmentioning
confidence: 99%
“…The destruction of liquid films on a heated wall is of great technical importance, since this determines the allowable heat flux in a number of engineering applications. A comparison between the flowing fluid film and the liquid film moving under the action of the gas flow is shown in [12,13]. Surface temperature, heat flux for formation of the first dry spot and critical heat flux are shown and analysed in the paper [12].…”
Section: Introductionmentioning
confidence: 99%
“…A comparison between the flowing fluid film and the liquid film moving under the action of the gas flow is shown in [12,13]. Surface temperature, heat flux for formation of the first dry spot and critical heat flux are shown and analysed in the paper [12]. The critical heat flux is measured and shown, the liquid film moving under the action of the gas flow is up to five times more efficient than the flowing fluid film.…”
Section: Introductionmentioning
confidence: 99%
“…Thin and ultrathin (<10 μm) liquid films moving under the action of a forced gas or vapor flow in the channel are promising for the use in thermal control systems of modern semiconductor devices [2]. Works [3][4][5] are devoted to analytical and numerical study of hydrodynamics and heat and mass transfer during joint motion of intensively evaporating liquid film and gas flow in microchannels.…”
Section: Introductionmentioning
confidence: 99%