In this work, we developed an optimized ultrasonic spray pyrolysis device for obtaining metal oxide films. The key benefit of this facility lies in its cost-effectiveness and its ability to consistently coat extensive surfaces without sacrificing the integrity of the semi-conductive films, thus streamlining the manufacturing process of semiconductor films. The resulting films exhibit the following attributes: the thickness of the deposited layer is approximately 400 nm, while the diameters of ZnO1-xSx nanocrystals range from 50 to 200 nm, oriented perpendicular to the crystallographic orientation (111). In the production of nanorods, the average height is estimated to be approximately 30-50 nm, with a density of 2.9×10¹¹ cm⁻² being indicated.