Longitudinal stitching of sub-micron periodic fringes on a roller

Chen, Lien-Sheng; Yen, Jia‐Yush; Chen, Yung-Pin; Wang, Lon A.; Chung, Tien-Tung; Lin, Hung‐I; Chen, Ping-Hung; Chang, Shu‐Ting

doi:10.1016/j.mee.2011.07.006

Cited by 2 publications

(2 citation statements)

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“…As imprinting areas increase, the loss caused by discontinuities rises too. As a result, some efforts have been focusing on directly patterning microstructures on cylindrical surfaces so that seamless molds can be obtained, for example precision machining [9,10], laser ablation [11,12], curved surface lithography [13][14][15] and maskless curved surface lithography [16][17][18][19]. In curved surface lithography, a photoresist (PR) layer is first uniformly coated on the roller surface and then exposed by ultraviolet (UV) light energy through a photomask.…”

Section: Introductionmentioning

confidence: 99%

Step and scanning lithography for patterning seamless microstructures on the inner surface of a hollow roller

Nguyen

Lee²

2019

J. Micromech. Microeng.

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This paper presents a step-and-repeat photolithography method for patterning seamless microstructures on the inner cylindrical surface of a hollow roller. The purpose is for subsequent replication of the microstructures onto the surface of another mold for roller imprinting. The processes include coating of a photoresist (PR) layer, ultraviolet (UV) exposing the PR layer with a photomask, and finally PR developing to obtain patterned microstructures on the inner cylindrical surface. To achieve seamless patterning, UV exposure process is first conducted locally on a narrow and slender area and then consecutively repeated. Through efforts on precision mechanical system design and using a collimated UV light source, consecutively exposed areas can be seamlessly stitched together to form a complete UV exposed pattern on the inner cylindrical surface. Experiments have been carried out using three photomasks with hexagonal arrays of hexagons and circles. Typical feature sizes are around ten to a few tens of micrometers. Details on the experimental results as well as future perspectives on the applications of this new type of lithography for roller imprinting will be addressed.

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Section: Introductionmentioning

confidence: 99%

Step and scanning lithography for patterning seamless microstructures on the inner surface of a hollow roller

Nguyen

Lee²

2019

J. Micromech. Microeng.

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“…Different approaches have used ultraviolet (UV), 4,5 x-ray, 6 or electron beam [7][8][9] sources to pattern a photoresist layer. The patterned photoresist can then be used directly for imprinting or act as a mask for etching or deposition of more durable metal patterns.…”

Section: Introductionmentioning

confidence: 99%

Laser direct write system for fabricating seamless roll-to-roll lithography tools

Petrzelka

Hardt

2013

SPIE Proceedings

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Implementations of roll to roll contact lithography require new approaches towards manufacturing tooling, including stamps for roll to roll nanoimprint lithography (NIL) and soft lithography. Suitable roll based tools must have seamless micro-or nano-scale patterns and must be scalable to roll widths of one meter. The authors have developed a new centrifugal stamp casting process that can produce uniform cylindrical polymer stamps in a scalable manner. The pattern on the resulting polymer tool is replicated against a corresponding master pattern on the inner diameter of a centrifuge drum. This master pattern is created in photoresist using a UV laser direct write system. This paper discusses the design and implementation of a laser direct write system targeting the internal diameter of a rotating drum. The design uses flying optics to focus a laser beam along the axis of the centrifuge drum and to redirect the beam towards the drum surface. Experimental patterning results show uniform coatings of negative photoresist in the centrifuge drum that are effectively patterned with a 405 nm laser diode. Seamless patterns are shown to be replicated in a 50 mm diameter, 60 mm long cylindrical stamp made from polydimethylsiloxane (PDMS). Direct write results show gratings with line widths of 10 microns in negative photoresist. Using an FPGA, the laser can be accurately timed against the centrifuge encoder to create complex patterns.

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Longitudinal stitching of sub-micron periodic fringes on a roller

Cited by 2 publications

References 15 publications

Step and scanning lithography for patterning seamless microstructures on the inner surface of a hollow roller

Step and scanning lithography for patterning seamless microstructures on the inner surface of a hollow roller

Laser direct write system for fabricating seamless roll-to-roll lithography tools

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