Abstract:An important step in today's Integrated Circuit (IC) manufacturing is optical proximity correction (OPC). While OPC increases the fidelity of pattern transfer to the wafer, it also results in significant increase in IC layout file size. In this paper, we develop two techniques for compressing post-OPC layout data while remaining compliant with existing industry standard data formats such as OASIS and GDSII. The motivation for doing so is for the resulting compressed files to be viewed and edited by any industr… Show more
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