2021
DOI: 10.1016/j.polymertesting.2021.107316
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Low-cost nanofabrication of isoporous nanomembranes using hybrid lithography

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Cited by 6 publications
(1 citation statement)
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“…As is well known, the top-down process provides more precise control technology for feature size and size distribution; however, the bottom-up process allows more costeffective and affordable control and the production of thick nanopore membranes using only limited quality control. [8][9][10][11] So, both technologies provide a trade-off relationship between cost and quality. The top-down processes can be divided into four categories, including e-beam lithography, extreme ultraviolet (EUV) or X-ray lithography, nanoimprinting, and track-etching.…”
Section: Fabrication Of Sin X Nanopore Filters Using Combined Process...mentioning
confidence: 99%
“…As is well known, the top-down process provides more precise control technology for feature size and size distribution; however, the bottom-up process allows more costeffective and affordable control and the production of thick nanopore membranes using only limited quality control. [8][9][10][11] So, both technologies provide a trade-off relationship between cost and quality. The top-down processes can be divided into four categories, including e-beam lithography, extreme ultraviolet (EUV) or X-ray lithography, nanoimprinting, and track-etching.…”
Section: Fabrication Of Sin X Nanopore Filters Using Combined Process...mentioning
confidence: 99%