2019
DOI: 10.3390/coatings9040227
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Low Deposition Temperature-Induced Changes of the Microstructure and Tribological Property of WS2 Film

Abstract: Pure WS2 films were prepared by the radio frequency sputtering of a WS2 target with the initial substrate temperature controlled to −40, −25, 0 °C and room temperature by cooling the holder with liquid nitrogen, respectively. The influence of the substrate temperature on the microstructures and the tribological properties of the prepared films have been evaluated and the wear mechanism of the films was explained. It revealed that with decreasing the substrate temperature, the prepared WS2 film changed from the… Show more

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