Low emissivity Ag/Si/glass thin films deposited by sputtering

Park, Sun Ho; Lee, Kee Sun; Reddy, A. Sivasankar

doi:10.1016/j.solidstatesciences.2011.08.029

Cited by 16 publications

(7 citation statements)

References 17 publications

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“…A low-e coating for glazing should show spectral selectivity, i.e. have a high transmittance in the visible range of the spectrum to allow visible light inside, and at the same time provide high reflectance in the near infrared part of the spectrum (Park et al [59]). Note that because of the extra energy provided by visible light transmitting through the window, the solar heat gain will be larger through transparent areas of a facade.…”

Section: Transparent Materials 221 Transparent Materials In Generalmentioning

confidence: 99%

Low-emissivity materials for building applications: A state-of-the-art review and future research perspectives

Jelle

Kalnæs

Gao

2015

Energy and Buildings

229

100

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Low-emissivity (low-e) materials can be used in order to reduce energy usage in both opaque and transparent areas of a building. The main focus for low-e materials is to reduce the heat transfer through thermal radiation. Furthermore, low-e materials will also influence on the daylight and total solar radiation energy throughput in windows, the latter one often characterized as the solar heat gain coefficient (SHGC). This work reviews low-e materials and products found on the market, and their possible implementations and benefits when used in buildings. The SHGC is often left out by many countries in energy labellings of windows. With opaque materials, research is still ongoing to correctly calculate the effect with regard to thermal performance when applied in buildings. Future research perspectives on where low-e technologies may develop are explored. To the authors' knowledge, there seems to be little available literature on how ageing affects low-e materials and products. As this is of large significance when calculating energy usage over the lifetime of a building, ageing effects of low-e materials should be addressed by manufacturers and the scientific community.

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Section: Transparent Materials 221 Transparent Materials In Generalmentioning

confidence: 99%

Low-emissivity materials for building applications: A state-of-the-art review and future research perspectives

Jelle

Kalnæs

Gao

2015

Energy and Buildings

229

100

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“…The emissivity of Ag(9 nm)/Ti(1 nm)/AZO(25 nm)/glass and Ag(9 nm)/Nb(1 nm)/AZO(25 nm)/glass structures were found as 0.0361 and 0.0357, respectively, compared to 0.0835 for Ag(9 nm)/AZO(25 nm)/glass structure and 0.14 for Ag (9 nm/glass) in Ref. It was clearly shown that subnanometer thick M‐Seeds effectively changed the nanostructure of the ultrathin Ag films and reduced the resistance and emissivity.…”

Section: Resultsmentioning

confidence: 95%

Ag/M‐seed/AZO/glass structures for low‐E glass: Effects of metal seeds

Sönmez

Dönmez

Comert

et al. 2017

Int J of Appl Glass Sci

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In this work, continuous and conductive ultrathin Ag films with highly infrared reflective and highly visible transmittance were achieved using several metal seeds (Ti, Nb, Cr, Ni, Mo, Pt, Cu, and Ru), having ~1‐2 nm in thickness, deposited between Ag and dielectric AZO layers on glass substrate by magnetron sputtering with confocal target geometry. The optical properties in the visible and infrared ranges and conductivity of Ag/M‐seed/AZO/glass structures were compared in order to determine the influence of the seeds. It was observed that all M‐Seeds increased both visible transmittance and infrared reflectance. But also, it was shown that Nb and Ti seed layers which help on coalesced of Ag and AZO layers are more effective on the electro‐optical characteristics of the Ag thin films than the other seeds. Ag/Nb/AZO/glass and Ag/Ti/AZO/glass structures showed 2.81 and 2.84 Ω/□ sheet resistance and low surface roughness, respectively, which are the best film structures. In addition, these films have homogeneous and defect‐free surfaces that do not cause any electrical breakdown. Besides, Nb and Ti seeded structures have the low‐emissivity both 780‐2500 nm and long wavelength (λ > 3 μm) spectral region as 0.0357 and 0.0361, respectively.

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“…This confirms that a TaN x layer can act to stabilize Ag films. Agglomeration is generally driven by the relatively high Ag/glass interfacial energy and is minimized by changing the growth mode from 3‐D to 2‐D . After annealing the films, agglomeration of Ag was increased greatly in Ag/glass films, and Ag/TaN x /glass films also show some microstructural differences compared to as deposited films; this may be due to changes in film composition and interfacial energies.…”

Section: Resultsmentioning

confidence: 99%

“…However, Ag‐based low‐e films are not durable against mechanical abrasion or corrosion attack and are unstable at high temperatures. In addition, ultrathin Ag films do not adhere well to glass substrates and easily agglomerate (fast surface diffusion), leading to the degradation of the optical and electrical properties . However, three‐dimensional (3‐D) growth of the films, more commonly known as island growth, results in relatively high absorption in the visible range and low infrared reflectance.…”

Section: Introductionmentioning

confidence: 99%

“…Therefore, two‐dimensional (2‐D) growth of the films on to the substrate is more desirable. Although many efforts have been made to understand the growth of Ag films and their optical (emissivity) properties, the behavior of thin films annealed at different temperatures has rarely been reported. In the past decades, Ag films have been grown in multilayer sandwich structures with dielectric materials (DEs), i.e.…”

Section: Introductionmentioning

confidence: 99%

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Effect of TaN_x on electrical and optical properties of annealed TaN_x/Ag/TaN_x films

Akepati

Loka

et al. 2013

Surface & Interface Analysis

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As‐deposited Ag(10 nm)/glass films exhibited agglomerated nanocrystals with seemingly thick boundaries. Introduction of a TaNx layer below the Ag films resulted in dense and smooth structures, with a resistance at least three times lower than that of Ag/glass. For TaNx(10 nm)/Ag(10 nm)/TaNx(10 nm)/glass multilayer films, Auger electron spectroscopy results indicate that TaNx acts as an effective barrier restraining the diffusion of Ag. After annealing (up to 573 K), no outward diffusion of Ag through either TaNx layer was seen. However, partial oxidation of the outermost TaNx layer to form Ta2O5 was observed. The films showed promising optical properties with 73% transmittance in the visible region and ~15% average transmittance in the near‐infrared region. The optical data obtained here was in good agreement with simulated predictions. Copyright © 2013 John Wiley & Sons, Ltd.

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Low emissivity Ag/Si/glass thin films deposited by sputtering

Cited by 16 publications

References 17 publications

Low-emissivity materials for building applications: A state-of-the-art review and future research perspectives

Low-emissivity materials for building applications: A state-of-the-art review and future research perspectives

Ag/M‐seed/AZO/glass structures for low‐E glass: Effects of metal seeds

Effect of TaN_x on electrical and optical properties of annealed TaN_x/Ag/TaN_x films

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Low emissivity Ag/Si/glass thin films deposited by sputtering

Cited by 16 publications

References 17 publications

Low-emissivity materials for building applications: A state-of-the-art review and future research perspectives

Low-emissivity materials for building applications: A state-of-the-art review and future research perspectives

Ag/M‐seed/AZO/glass structures for low‐E glass: Effects of metal seeds

Effect of TaNx on electrical and optical properties of annealed TaNx/Ag/TaNx films

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Effect of TaN_x on electrical and optical properties of annealed TaN_x/Ag/TaN_x films