2021
DOI: 10.1016/j.jcrysgro.2021.126323
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Low-energy femtosecond pulsed laser deposition of cerium (IV) oxide thin films on silicon substrates

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Cited by 3 publications
(2 citation statements)
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“…However, due to the absorption of multiple lower energy photons and energy accumulation from multiple pulses throughout the deposition, this cumulative process provides the ionization needed energy per atom, as recently demonstrated by De Mesa et al where CeO 2 thin films were deposited with good stoichiometry using low-energy fs-PLD. 40) Al, which has low cohesive energy, will be easier to ablate and is observed at large quantities as compared to Nd and Y. With considerably higher cohesive energy compared to other elements in the target, Y requires higher energy to dissociate into neutral atoms from the Nd:YAG target.…”
Section: Discussionmentioning
confidence: 99%
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“…However, due to the absorption of multiple lower energy photons and energy accumulation from multiple pulses throughout the deposition, this cumulative process provides the ionization needed energy per atom, as recently demonstrated by De Mesa et al where CeO 2 thin films were deposited with good stoichiometry using low-energy fs-PLD. 40) Al, which has low cohesive energy, will be easier to ablate and is observed at large quantities as compared to Nd and Y. With considerably higher cohesive energy compared to other elements in the target, Y requires higher energy to dissociate into neutral atoms from the Nd:YAG target.…”
Section: Discussionmentioning
confidence: 99%
“…As a result, fs-PLD has been utilized in several works to deposit oxide films. 34,36,39,40) A particular area of interest, especially with oxide materials, is the deposition of nanostructured oxide films. The use of ns-PLD led to the overimposition of larger particles in the micron range, which is unfavorable for the application of oxide-based devices.…”
Section: Introductionmentioning
confidence: 99%