The formation of a TiO͑001͒ film on MgO͑001͒ was investigated using metastable impact electron spectroscopy ͑MIES͒, ultraviolet photoelectron spectroscopy ͑He I͒, impact-collision ion scattering spectroscopy, and electron diffraction techniques. It was found that epitaxial TiO films were formed by Ti deposition on the MgO surface followed by annealing at 1000 K. The TiO film formation was related to the incorporation of oxygen from MgO into the deposited Ti film. Metallic properties of the outermost surface of the TiO film were strongly suggested by the fact that electron emission due to the autodetachment mechanism occurred in MIES, where the interaction was determined by the Coulomb interaction between temporary negative He Ϫ * ions and the hole created at the TiO surface. The work function increased from 2.6 to 5.0 eV when the TiO surface was exposed to O 2 . The electronic structure of the MgO-͑2ϫ2͒-Ti superstructure was also investigated. It is suggested that Ti is in the four-valent state at the 2ϫ2 surface.