Low-frequency capacitor with hopping electrical conductivity of the working substance (on the example of a-Si:H)
N. A. Poklonski,
I. I. Anikeev,
S. A. Vyrko
Abstract:We propose a structural and electrical schemes of a capacitor based on a 3 μm thick a-Si:H (amorphous hydrogenated silicon) layer separated from the metal plates by 0.3 μm thick dielectric layers of SiO2 (silicon dioxide). We consider room temperatures (T ≈ 300 K) when in the absence of illumination for a-Si:H the hopping mechanism of electron migration via point defects of the structure prevails. For such a capacitor, the dependencies of the capacitance on the frequency of the measuring signal ω/2π in the ran… Show more
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