By including the generation-recombination process of charge carriers in conduction channel, a model for low-frequency noise in pentacene organic thin-film transistors (OTFTs) is proposed. In this model, the slope and magnitude of power spectral density for low-frequency noise are related to the traps in the gate dielectric and accumulation layer of the OTFT for the first time. The model can well fit the measured low-frequency noise data of pentacene OTFTs with HfO 2 or HfLaO gate dielectric, which validates this model, thus providing an estimate on the densities of traps in the gate dielectric and accumulation layer. It is revealed that the traps in the accumulation layer are much more than those in the gate dielectric, and so dominate the low-frequency noise of pentacene OTFTs. V C 2013 AIP Publishing LLC. [http://dx.doi.org/10.1063/1.4816103] 044503-3 Han et al. J. Appl. Phys. 114, 044503 (2013) [This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to ] IP: 136.165.238.131 On: Mon, 22 Dec 2014 16:48:42 044503-4 Han et al. J. Appl. Phys. 114, 044503 (2013) [This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to ] IP: 136.165.238.131 On: Mon, 22 Dec 2014 16:48:42 044503-5 Han et al. J. Appl. Phys. 114, 044503 (2013) [This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to ] IP: 136.165.238.131 On: Mon, 22 Dec 2014 16:48:42 044503-6 Han et al.