Low-Loss Passive Optical Waveguides Based on Photosensitive Poly(pentafluorostyrene-<i>co</i>-glycidyl methacrylate)

Pitois, Claire; Vukmirovic, Sonia; Hult, Anders; Wiesmann, D.; Robertsson, Mats

doi:10.1021/ma981057x

Cited by 123 publications

(74 citation statements)

References 26 publications

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“…Photo-crosslinked PG2 films were fabricated by depositing a PG2 solution having 2 wt % of BDSDS/PTPDS as a photo-acid generator (PAG) onto the clean silicon substrate. [31] Spin-coating of 0.3 wt % solution in cyclopentanone at 4000 rpm gave ∼ 16 nm thick films. Following UV exposure, post-exposure bake (PEB) was done at 130°C for 30 min.…”

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confidence: 99%

Photopatternable Imaging Layers for Controlling Block Copolymer Microdomain Orientation

et al. 2007

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Block copolymer (BCP) lithography has emerged as a promising strategy to create highly regular and dense dot or line arrays at the sub-50 nm length scale. [1][2][3][4][5][6] Block copolymer lithography refers to the use of self-assembled domain structures, typically spheres, cylinders, and lamellas in thin-film form as a template for the addition and subtraction nanofabrication processes. [5] Mainly two pattern geometries have been studied extensively: dense arrays of dots and dense arrays of lines and spaces. The former can be generated from sphereforming BCP or from cylinder-forming BCP with domains oriented perpendicular to the substrate, and the latter from cylinder-forming BCP with domains oriented parallel to the substrate or lamella forming BCP with domains oriented vertically to the substrate. These periodic arrays based on self-assembly in BCP thin films have been examined for fabrication of magnetic storage media, quantum dot arrays, photonic crystals, and nanowire transistors. [4,[7][8][9][10] Vertically oriented domain structures have distinct advantages in terms of pattern transfer to the underlying substrate and fabrication of high-aspect ratio features.[11] In the case of perpendicular cylinder or perpendicular lamellae, the orientation of the BCP microdomains can be controlled by solvent evaporation, electric fields, directional crystallization, [12][13][14][15] physical constraints (topography), or chemical patterns. [16][17][18][19] Perhaps the most common means to induce perpendicular domain orientation, however, is to chemically modify and control the interaction between the BCP and the substrate. [20,21] For example, the substrate can be chemically modified by using self-assembled monolayers (SAMs) or random copolymer brush. SAMs of alkylthiols (on gold) or alkylsiloxanes (on Si/SiO 2 ) with polar or non-polar terminal groups have been utilized to modify the substrate. [22][23][24] Exposure to different doses of X-ray in the presence of oxygen can further alter the polarity and hence the wetting behavior of the SAM resulting in a symmetric, neutral or asymmetric BCP morphology. [25] Mansky and coworkers demonstrated that the interfacial energies between the PS and PMMA blocks of P(S-b-MMA) and the substrate can be carefully balanced by grafting an end-hydroxy functionalized P(S-r-MMA) polymer on the SiO x /Si substrate. [20,26,27] Covalent grafting of P(S-r-MMA)having f St (where f st is the styrene fraction) of 0.58 resulted in the neutral wetting behavior and the vertical orientation of lamellar or cylindrical domains. In this original report covalent grafting is usually achieved through the dehydration reaction between the end-hydroxy functionalized P(S-r-MMA) and the native oxide layer of silicon substrate. Ryu et. al recently reported an elegant chemistry to create substrate independent neutral surface through the self thermal crosslinking reaction of benzocyclobutene (BCB)-containing random copolymers at temperatures above 200°C.[28] The high temperature required for efficient cross-lin...

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Photopatternable Imaging Layers for Controlling Block Copolymer Microdomain Orientation

et al. 2007

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“…As an application of the above proposed technique, the related parameters are selected as: the refractive index and amplitude bulk attenuation coefficient are n 1 = 1.643 and α 1 = 2.0 dB/cm for the core material AJ309 (Enami et al 2007a, b), n 2 = 1.461 and α 2 = 0.25 dB/cm for the buffer layer material PFS-GMA (Pitois et al 1999), and n 4 = 1.0 and α 4 = 0 for the upper confined layer material air. The central operation wavelength is λ 0 = 1550 nm.…”

Section: Structural Parametersmentioning

confidence: 99%

Investigation on push-pull polymer Mach-Zehnder interferometer electro-optic switches using improved 3-D mode propagation analysis method

Zheng

Cui

et al. 2011

Opt Quant Electron

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By introducing normalized mode excitation coefficient and total mode excitation coefficient, we improve the 3-D mode propagation analysis (MPA) method for convenient design and analysis of multimode interference (MMI) coupler. With the improved 3-D MPA method and point-matching method, we present a novel formulation technique to analyze the low-and high-frequency characteristics for the impedance-matched polymer Mach-Zehnder interferometer electro-optic (EO) switch based on MMI couplers. As an application, under 1550 nm, optimization and simulation performed for the designed device reveal low driving voltage of 1.375 V with short EO region length of 5 mm. The insertion loss and extinction ratio are less than 3.75 dB and more than 42 dB, respectively. The microwave characteristic impedance is about 49.6 , and due to the less mismatch between lightwave velocity and microwave velocity, the estimated cutoff switching frequency is up to 263 GHz with the 10-90% rise time and fall time about 1.90 ps under the operation of step-style square-wave switching signal. This theoretical cutoff switching frequency is almost 1.53 times of that of our previous reported shielded EO switch with similar design technique.

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“…[5] Applications of fluorinated/semifluorinated polymers range from the generation of low energy surfaces, [6] surface modified membranes to low dielectric constant, and low optical loss used in waveguide devices. [7] In addition, superhydrophobic thin film coatings have also been prepared from microporous layer-by-layer (LbL) assemblies. [8][9][10][11][12][13][14][15][16] Along with the coating of (semi)fluorinated compounds, an increase in surface roughness has shown to be effective in enhancing the hydrophobicity of films.…”

Section: Introductionmentioning

confidence: 99%

Free‐Standing Films of Semifluorinated Block Copolymer Brushes from Layer‐by‐Layer Polyelectrolyte Macroinitiators

Estillore¹,

Advíncula²

2011

Macro Chemistry & Physics

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Free‐standing semifluorinated polymer brushes from layer‐by‐layer (LbL) macroinitiators are demonstrated. LbL deposition of macroinitiators is followed by surface‐initiated atom transfer radical polymerization (SI‐ATRP). Increasing the number of LbL macroinitiator layers increases grafting density and thickness. The SI‐ATRP is conducted by first polymerizing a block of polystyrene followed by the semifluorinated poly‐2,2,2‐trifluoroethyl methacrylate block. Solvent selective response is investigated by AFM imaging and water contact angle measurements. Specifically, the solvent response of the semifluorinated block copolymer brushes exhibits alternate selectivity to cyclohexane and trifluorotoluene. Solvent responsive free‐standing films are also demonstrated. magnified image

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Low-Loss Passive Optical Waveguides Based on Photosensitive Poly(pentafluorostyrene-co-glycidyl methacrylate)

Cited by 123 publications

References 26 publications

Photopatternable Imaging Layers for Controlling Block Copolymer Microdomain Orientation

Photopatternable Imaging Layers for Controlling Block Copolymer Microdomain Orientation

Investigation on push-pull polymer Mach-Zehnder interferometer electro-optic switches using improved 3-D mode propagation analysis method

Free‐Standing Films of Semifluorinated Block Copolymer Brushes from Layer‐by‐Layer Polyelectrolyte Macroinitiators

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