Low-loss PECVD silica channel waveguides for optical communications

Grand, G.; Jadot, J.; Denis, Hervé; Valette, S.; Fournier, A.; Grouillet, A.

doi:10.1049/el:19901375

Cited by 67 publications

(21 citation statements)

References 3 publications

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“…In glass optical fibre losses much less than 1 dB per kilometer are achieved. The techniques used to ensure compositional purity and uniformity in optical fibre manufacture cannot yet be reproduced in planar waveguide manufacturing, but waveguide losses of less than 0.1 dB/cm are routinely achieved in planar glass waveguides deposited on silicon [3,33]. Glass waveguide core dimensions and cladding-core index steps can closely match those of optical fibre.…”

Section: Silica Glass Waveguides On Siliconmentioning

confidence: 99%

“…Recently silica deposition by plasma enhanced chemical vapor deposition (PECVD) has become accepted for waveguide manufacture [1,2,3,4,5,6]. PECVD can also grow silica layers at rates of several hundred nanometers per minute, with excellent control over the uniformity of refractive index and layer thickness.…”

Section: Silica Glass Waveguide Growthmentioning

confidence: 99%

“…The glass network often contains significant concentrations of hydrogen and nitrogen, which can contribute to waveguide absorption. In particular, strong absorption lines centered at λ = 1480 nm and λ = 1510 nm associated with overtones of the N-H and Si-H bonds often appear [1,3,36]. These lines can be particularly strong in silicon oxynitrides.…”

Section: Silica Glass Waveguide Growthmentioning

confidence: 99%

“…• C [1,3]. Annealing releases hydrogen trapped in the glass during growth, and plays a similar role to the high temperature anneal in FHD by consolidating and homogenizing the glass.…”

Section: Silica Glass Waveguide Growthmentioning

confidence: 99%

“…Extremely low loss and uniform silica glass waveguides can be deposited on silicon using chemical vapor deposition [1,2,3,4,5,6] and flame hydrolysis [7,8,9,10,11]. Silicon itself has become the most widely used platform for large-scale planar waveguide circuits.…”

Section: Introductionmentioning

confidence: 99%

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Silicon-Based Waveguide Technology for Wavelength Division Multiplexing

Janz

2004

Topics in Applied Physics

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Abstract. This chapter reviews the application of silicon-based planar waveguide components for wavelength division multiplexing (WDM) and demultiplexing. The polarization dependent properties and dominant waveguide loss mechanisms in both silica-on-silicon and silicon-on-insulator (SOI) waveguides are described, and the technologies developed to control loss and eliminate polarization dependence in both material platforms are presented and compared. Although less mature, the development of high index contrast devices in SOI closely parallels the evolution of silica glass waveguide technology. Many of the important design challenges have been resolved, and the performance of SOI-based integrated optic components is rapidly approaching that of the silica waveguide system.

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Section: Silica Glass Waveguides On Siliconmentioning

confidence: 99%

Section: Silica Glass Waveguide Growthmentioning

confidence: 99%

Section: Silica Glass Waveguide Growthmentioning

confidence: 99%

“…• C [1,3]. Annealing releases hydrogen trapped in the glass during growth, and plays a similar role to the high temperature anneal in FHD by consolidating and homogenizing the glass.…”

Section: Silica Glass Waveguide Growthmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

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Silicon-Based Waveguide Technology for Wavelength Division Multiplexing

Janz

2004

Topics in Applied Physics

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Ultrafast laser written active devices

Ams¹,

Marshall

Dekker

et al. 2009

Laser & Photonics Reviews

178

114

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Direct-write optical waveguide device fabrication is probably the most widely studied application of femtosecond laser micromachining in transparent dielectrics at the present time. Devices such as buried waveguides, power splitters, couplers, gratings, optical amplifiers and laser oscillators have all been demonstrated. This paper reviews the application of the femtosecond laser direct-write technique to the fabrication of active waveguide devices in bulk glass materials.White light diffraction from waveguide Bragg gratings fabricated in doped phosphate glass using the femtosecond laser direct-write technique. Such a waveguide Bragg grating was instrumental to the first demonstration of a monolithic waveguide laser using this technique.

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Novel polarization‐insensitive wavelength multiplexer/demultiplexer modules

Lü¹,

Ming‐Liu²,

Xiu‐Huang³

et al. 2003

Micro & Optical Tech Letters

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We report here in detail a polarization-insensitive arrayed-waveguide grating (AWG) with an all-optical polarization state controller (AOPSC). INTRODUCTIONRecently, devices using waveguide arrays to form high-order grating functions have been gaining importance as wavelength-division multiplexing (WDM) components. An arrayed waveguide grating (AWG) essentially consists of two star couplers that work as a Fourier transform lens, connected by a waveguide array that forms a grating. This device has become a key device for wavelength-addressed transmission systems and switching systems. However, the polarization dependence caused by waveguide bire- 42MICROWAVE AND OPTICAL TECHNOLOGY LETTERS / Vol. 38, No. 1, July 5 2003 fringence B ϭ n TE Ϫ n TM (n TE and n TM are the effective indices of the TE and TM modes, respectively) is a serious problem in actual systems. Several approaches, such as using polarization splitter [1], the use of a TE/TM converter with a /2-plate [2] and the method to make AWG's polarization insensitive based on matching the free spectral range (FSR) to the polarization dispersion [3] have been investigated with a view to achieve polarization insensitivity. However, the first method does not apply to N ϫ N devices, the second method needs additional processes and causes excess loss, and the third method will limit the WDM channels. In this paper we describe a simple and fundamental way to eliminate the polarization dependence of an AWG. A polarizationinsensitive multiplexer with a silicon-oxynitride structure of eight channels with a 0.8-nm wavelength spacing is described. AWG DESIGNWaveguides birefringence, that is a difference in propagation constants of TE and TM modes, will result in a wavelength shift ⌬ of the spectral responses with respect to each other. The center wavelength for each polarization is described as follows:in which f is the central frequency and c is the velocity of light. By solving ⌬ from Eq. (1), we obtainFor conventional AWGs, such as silica-based ones, the ⌬ is about in the order of 2-3 nm. For the InGaAsP-InP waveguide structure, the order of ⌬ is larger. Light with the same frequency will be coupled into the different receiver waveguides, which is called polarization dispersion.The polarization-insensitive AWG design is based on an asymmetric planar waveguide in the silicon-oxynitride material system with a high-refractive-index difference ⌬n ϭ 0.7% and large a/b (here, a is the width and b is the thickness of the core-layer waveguide). The high ⌬n and large a/b are chosen to eliminate the near degeneracy of the TE 0 and TM 0 modes, so that the two polarization modes have a different cutoff point. Furthermore, a higher ⌬n leads to a larger value of V, which corresponds to lower crosstalk, and also results in smaller d r /a [1] (d r is the pitch of the arrayed waveguides); it is possible to form a complicated waveguide layout on a small substrate with small bending radii. We choose the width a of the core layer waveguide to be 6 m. The refractive indices of t...

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Low-loss PECVD silica channel waveguides for optical communications

Cited by 67 publications

References 3 publications

Silicon-Based Waveguide Technology for Wavelength Division Multiplexing

Silicon-Based Waveguide Technology for Wavelength Division Multiplexing

Ultrafast laser written active devices

Novel polarization‐insensitive wavelength multiplexer/demultiplexer modules

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