2002
DOI: 10.1109/lpt.2002.804651
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Low-noise impact-ionization-engineered avalanche photodiodes grown on InP substrates

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Cited by 44 publications
(20 citation statements)
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“…Their result showed that the extra energy was relatively small and had no effect on enhancement of impact ionization. This observation was later been further agreed by Wang et al [7,8] who conducted the excess noise measurements of submicron III-V heterojunction APD (HAPD). A structure of two-layers multiplication region with optimum width of energy build-up layer of Al 0.6 Ga 0.4 As material was proposed to achieve minimum noise figure.…”
Section: Introductionsupporting
confidence: 66%
“…Their result showed that the extra energy was relatively small and had no effect on enhancement of impact ionization. This observation was later been further agreed by Wang et al [7,8] who conducted the excess noise measurements of submicron III-V heterojunction APD (HAPD). A structure of two-layers multiplication region with optimum width of energy build-up layer of Al 0.6 Ga 0.4 As material was proposed to achieve minimum noise figure.…”
Section: Introductionsupporting
confidence: 66%
“…However, absent the longer impact ionization chains, the APD's mean gain is also reduced. A change in semiconductor alloy composition inside the APD junction will result in a change of both the impact ionization threshold energy and the impact ionization rate, narrowing the gain distribution by making impact ionization much more likely in some locations and much less likely in others [13], [29]. However, like APDs that employ dead-space effects, the spatial localization of impact ionization reduces the number of possible ionization chains and can result in reduced mean avalanche gain.…”
Section: Reducing Apd Multiplication Noisementioning
confidence: 99%
“…The pre-factors, A, for InGaAs were reduced by a factor of 2.85 from those published by Pearsall to fit the Monte Carlo model's calculation of excess noise factor to the measurements for the I 2 E structure reported by Wang et al [13]. This was done because the authors of this paper are unaware of any impact-ionization rate models published in the literature for the quaternary alloy Al 0.335 Ga 0.140 In 0.525 As used in the SCM APD multiplier.…”
Section: ) Monte Carlo Models Of Scm Apdmentioning
confidence: 99%
“…We have also demonstrated individual devices which we believe to be the largest of their type yet reported (1 mm), and impact-ionization-engineered (I 2 E) multiplication layers with extremely low excess noise [2,3]. Several growth attempts were necessary in each case to produce wafers suitable for the studies in question because of variations in device performance that were traced to run-to-run variations in material quality.…”
Section: Introductionmentioning
confidence: 99%