Device scaling is a pivotal aspect in the field of electronics, aimed at enhancing the performance of integrated circuits (ICs) by reducing the dimensions of transistors. The device scaling presents the short channel effects (SCEs) in the nanoscale regime. To address the SCEs, nanometer IC designers have turned to the carbon nanotube field-effect transistor (CNTFET) technology, which offers unique properties and mitigates the challenges associated with transistor scaling. In this research work, a leakage reduction technique known as the input-dependent (INDEP) method is suggested to tackle the leakage current issue at the nanoscale regime using CNTFET technology. The INDEP method involves the incorporation of two additional transistors within the logic circuit. To evaluate the efficacy of the INDEP method, a CNTFET-based 7-stage inverter chain is meticulously designed at 32 nm CNTFET technology node. Subsequent comparative analysis against alternative designs is conducted, assessing performance metrics such as power dissipation, delay, and power delay product (PDP). The suggested INDEP method reduces power dissipation by 83.75% and improves PDP by 78.44%. Furthermore, the study delves into the impact of process, voltage, and temperature (PVT) variations. Additionally, the investigation explores the influence of parameters such as the number of carbon nanotubes, temperature, supply voltage, and chiral indices on the performance of the 7-stage inverter chain. The simulation results demonstrate that the CNTFET-based INDEP technique yields promising outcomes, characterized by low power dissipation, precise output, and minimal uncertainty across all evaluated metrics.