2022
DOI: 10.1016/j.diamond.2021.108797
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Low-resistance ohmic contacts on boron-doped {113} oriented homoepitaxial diamond layers

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Cited by 11 publications
(7 citation statements)
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“…Specific contact resistance of Ru/Au contacts (circles–annealed at 650 °C) deposited on an ozone‐treated (113) homoepitaxial BDD layer versus N A −1/2 (room temperature measurement). The recently measured [ 8 ] values for Mo/Au (open boxes—annealed at 650 °C) and Ti/Au contacts (open triangles—annealed at 500 °C) are shown for reference.…”
Section: Resultsmentioning
confidence: 99%
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“…Specific contact resistance of Ru/Au contacts (circles–annealed at 650 °C) deposited on an ozone‐treated (113) homoepitaxial BDD layer versus N A −1/2 (room temperature measurement). The recently measured [ 8 ] values for Mo/Au (open boxes—annealed at 650 °C) and Ti/Au contacts (open triangles—annealed at 500 °C) are shown for reference.…”
Section: Resultsmentioning
confidence: 99%
“…Prior to contact deposition, the sample surfaces were ozone treated by a lab-made system at 150 °C and atmospheric pressure for 20 min with the assistance of UV light illumination to obtain a clean oxygen-terminated surface. [8] Schottky, on the top p À layer, and ohmic contacts, on the p þ contact layer, were realized by the e-beam evaporation of Ru/Au metallic bilayer according to the procedure described above. Since Ru (see Section 3.1) forms an excellent ohmic contact on (113)-oriented BDD with metallic conductivity, a single metallization can be used for the creation of pVSBDs.…”
Section: Methodsmentioning
confidence: 99%
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