2010
DOI: 10.1002/anie.200907168
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Low‐Temperature ABC‐Type Atomic Layer Deposition: Synthesis of Highly Uniform Ultrafine Supported Metal Nanoparticles

Abstract: Sheltered growth: A novel atomic layer deposition (ALD) method to synthesize highly uniform ultrafine supported metal nanoparticles is described. The ALD process includes growing protected metal nanoparticles and new support layers simultaneously at low temperature. In the final stage, the activation of the metal nanoparticles can be achieved by removing the protective ligands through calcination or reduction at elevated temperature (see picture).

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Cited by 89 publications
(97 citation statements)
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“…For example, techniques such as atomic layer deposition could be employed to generate well-defined coverages of different metal and metal oxide layers on both model surfaces and high-surface area catalysts. [161][162][163][164][165][166][167] Another opportunity for generating control over the interface (and being able to employ reliable computational modeling approaches) is to employ metal nanoparticles that are very well-defined in their structure [168][169][170][171][172][173][174] , including the use of single metal atoms as catalysts. [175][176][177][178] Finally, work using tethered organocatalysts suggests an interesting path for designing bifunctional catalysts for biomass conversions.…”
Section: Discussionmentioning
confidence: 99%
“…For example, techniques such as atomic layer deposition could be employed to generate well-defined coverages of different metal and metal oxide layers on both model surfaces and high-surface area catalysts. [161][162][163][164][165][166][167] Another opportunity for generating control over the interface (and being able to employ reliable computational modeling approaches) is to employ metal nanoparticles that are very well-defined in their structure [168][169][170][171][172][173][174] , including the use of single metal atoms as catalysts. [175][176][177][178] Finally, work using tethered organocatalysts suggests an interesting path for designing bifunctional catalysts for biomass conversions.…”
Section: Discussionmentioning
confidence: 99%
“…We recently developed a strategy of low-temperature ABC-type metal ALD for synthesizing subnanometer metal clusters with high loadings, as depicted in Fig. 11 [117,118]. This procedure combines the deposition of catalytic metal at low temperatures (50-150°C…”
Section: Temperature Effectmentioning
confidence: 99%
“…Fig. 12 shows a Pt/TiO 2 catalyst with an average particle size of 0.5 nm at a loading of 1.2 wt % synthesized using the A/B/C sequence: MeCpPtMe 3titanium isopropoxide (TTIP)-H 2 O. Reprinted with permission from [118]. Copyright © 2010 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.…”
Section: Temperature Effectmentioning
confidence: 99%
“…This passivation layer is used to protect the catalyst from sintering and is undesirable for catalysis applications. 54 More interesting, ALD has been creatively used by several groups 57,62 to protect the catalyst from sintering in a high temperature reaction environment. This principle could be readily extended to protect catalysts on PEC electrodes to extend catalyst lifetimes.…”
Section: Catalyst Engineering For Photoelectrochemical Electrodesmentioning
confidence: 99%