Low-temperature assembly of ordered carbon nanotip arrays in low-frequency, high-density inductively coupled plasmas

PECVD of Carbon Nanostructures in Hydrocarbon‐Based RF Plasmas

“…This situation is not common for conventional thermal CVD processes. On the other hand, the OES results indicate on the possibility of elevated densities of CH 3 and H species when the substrate bias increases to -300 V. Remarkably, this correlates with the fact that the nanopyramid structures are most regular and free of amorphous deposits under this DC bias value [17,18,30]. The abundance of the plasma species observed by the OES in our experiments is also consistent with previous studies of the roles of hydrogen atom and methyl radical in elementary processes involved in the growth of hydrogenated carbon films [21].…”

“…1, ICPs). The details of the plasma source and discharge operation are described elsewhere [16][17][18]. Nickel-based catalyst-coated silicon substrates were placed in the active area of the plasma reactor, facing the external flat spiral on the top of the chamber, approximately 10-12 cm below the quartz window separating the reactor chamber and the RF coil.…”

Oxygen plasma functionalization of poly(p-phenilene sulphide)

“…The leak valve is adjusted to maintain the pressure of 100 Pa in the discharge vessel. Inductively coupled plasmas [15][16][17] are created by rf generator with the frequency of 27.12 MHz and the output power of about 100 W. Plasma parameters are measured with a double Langmuir probe and a fiber optics catalytic probe [18]. At our discharge parameters, the plasma parameters of inductively coupled rf oxygen discharge are as follows: the electron temperature is about 3 eV, the density of charged particles about 4 Â 10 15 m À3 , and the neutral atom density 4 Â 10 21 m À3 .…”

Reactive Plasma‐Aided RF Sputtering Deposition of Hydroxyapatite Bio‐implant Coatings

“…A collimated optical probe was located in the vicinity of the deposition substrates, as sketched in Figure 10. More details about the OES and plasma discharge species identification can be found elsewhere [24][25][26]. …”