Low-temperature atmospheric discharge plasma and its applications for the surface treatment

Abstract

The atmospheric pressure low-temperature homogeneous discharge using helium and nitrogen, both known for industrial applications, was reviewed. In case of helium, metastable atoms (21s and 23s) produced in the glow discharge were able to dissociate mixed molecular gases to produce radicals or atoms. Radical species undergo chemical reactions, such as oxidation or nitration reaction and form products on the electrode surfaces. Applications of helium atmospheric pressure glow discharge including surface treatment of plastic films to enhance adhesibility with glue, weakening strength with pressure-sensitive glue, and deposition of solid material on a flat plate or powder surfaces, were described. Moreover, the microwave low-temperature discharge using nitrogen, as a cost-saving carrier gas, were introduced for the surface cleaning of silicon wafer.

Technological Principles of Complex Plasma-Beam Surface Treatment of Al2O3/TiC and SiAlON Ceramics

“…The authors suggested that for the controlled removal of a thin defective layer from the surface of ceramic products, physical processes (without intense temperature heating and mechanical action) can be used, which are based on the energy impact of directed flows of electrons, ions or neutral particles generated by various energy sources. A source of beams of accelerated ions and fast atoms of inert gases (argon) generated by low-temperature plasma of a glow discharge was chosen as a source of energy impact [58][59][60][61].…”