1999
DOI: 10.1002/(sici)1521-3889(199911)8:7/9<559::aid-andp559>3.0.co;2-7
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Low-temperature dephasing in disordered conductors: experimental aspects

Abstract: What is the lowest temperature to which one can trace the growth of the dephasing time τϕ in low-dimensional conductors? I consider the fundamental limitation, the crossover from weak to strong localization, as well as several experimental reasons for frequently observed saturation of τϕ (hot-electron effects, dephasing by external noise). Recent progress in our understanding of the electron-phonon interaction in disordered conductors is also briefly discussed.

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Cited by 29 publications
(15 citation statements)
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“…In contrast to SWCNT mats [9] lowtemperature saturation of resistance in our SWCNT films was observed even at low bias voltage. In difference from the high bias region, where saturation of RT dependences is induced by decreasing of the height of contact barriers between nanotubes, saturation at low bias can be also explained by low temperature saturation of dephasing time inherent for weakly disordered systems [10]. In the intermediate temperature range (10 K -125 K) at low bias voltage R(T) dependences can be approximated by following equation inherent for thermal fluctuationinduced tunneling (FIT) model [11]:…”
Section: Resultsmentioning
confidence: 99%
“…In contrast to SWCNT mats [9] lowtemperature saturation of resistance in our SWCNT films was observed even at low bias voltage. In difference from the high bias region, where saturation of RT dependences is induced by decreasing of the height of contact barriers between nanotubes, saturation at low bias can be also explained by low temperature saturation of dephasing time inherent for weakly disordered systems [10]. In the intermediate temperature range (10 K -125 K) at low bias voltage R(T) dependences can be approximated by following equation inherent for thermal fluctuationinduced tunneling (FIT) model [11]:…”
Section: Resultsmentioning
confidence: 99%
“…(a) In three-dimensional, weakly disordered, conductors (L φ < L x , L y , L z ), electronphonon (e-ph) scattering is the sole dominant inelastic dephasing process [22][23][24], i.e. 1/τ i (T , l) ≈ 1/τ ep (T , l).…”
Section: Introductionmentioning
confidence: 99%
“…Lastly, we discuss the advantage of using three-, instead of lower-dimensional, mesoscopic structures for τ φ measurements. In 3D, the dominating inelastic process is the electronphonon scattering for which τ ep obeys a strong T −p (2 ≤ p ≤ 4) dependence [16,19]. Such a temperature variation is much stronger than the dominating p = 2/3 in one dimension and p = 1 in two dimensions (which are both due to electron-electron scattering [20]).…”
mentioning
confidence: 99%
“…where τ 0 φ dominates at the lowest measurement temperatures, and τ i is the relevant inelastic scattering time which is usually important at a (few) degree(s) kelvin and higher. In three dimensions, electron-phonon scattering is the predominant inelastic process while the Nyquist electron-electron scattering is negligibly small [19], i.e. 1/τ i ≈ 1/τ ep in eq.…”
mentioning
confidence: 99%