2005
DOI: 10.1143/jjap.44.5
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Low-Temperature Fabrication of Ultrathin ZrO2/Si Structure Using Metal Deposition Followed by Oxygen Annealing

Abstract: Using an ultrasonic technique, the diffusion of Cu, Ag and Au in lowresistivity single-crystal CdS was studied. For Cu and Ag over the temperature range 300-700 "C, the diffusion coefficients (cme s-I) were found to be and for Au over the range 500-800 "C, the diffusion coefficient was No significant anisotropy was found in diffusion coefficients of Ag measured parallel or perpendicular to the c axis. The activation energy of diffusion was found to increase linearly with the atomic mass of the diffusing elemen… Show more

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Cited by 18 publications
(13 citation statements)
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“…Some literatures have also reported that ZrO 2 thin films were successfully formed by a combination of Zr metal sputtering and oxidation process in oxygen ambient [6,[21][22][23][24]. However, literatures have shown that an undesirable interfacial layer (IL) was inevitably formed during the oxidation process in oxygen ambient [25,26].…”
Section: Introductionmentioning
confidence: 99%
“…Some literatures have also reported that ZrO 2 thin films were successfully formed by a combination of Zr metal sputtering and oxidation process in oxygen ambient [6,[21][22][23][24]. However, literatures have shown that an undesirable interfacial layer (IL) was inevitably formed during the oxidation process in oxygen ambient [25,26].…”
Section: Introductionmentioning
confidence: 99%
“…[5][6][7][8][9] Based on the reported literatures, stoichiometric ZrO 2 thin films have been successfully formed by a combination of sputtered of Zr metal with thermal oxidation in O 2 ambient. [3,[10][11][12] However, an undesirable interfacial layer (IL) has formed along with the formation of ZrO 2 thin films. As a result, capacitance of the MOS structure is reduced significantly.…”
Section: Introductionmentioning
confidence: 99%
“…As an another example, for fabricating nanostructures, since a cantilever suitable for fabrication is not always the best choice for imaging the results at high resolution, investigating the fabricated nanostructures in detail is often difficult. 13 To overcome such limitations, we developed a dual-probe (DP) AFM system with two independently controlled probes. Since the two probes can be located at any position in an area of concern, various experiments can be performed using the DP-AFM system.…”
Section: Introductionmentioning
confidence: 99%