2020
DOI: 10.1039/c9ce01541h
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Low temperature growth of (AlGa)2O3 films by oxygen radical assisted pulsed laser deposition

Abstract: Low temperature growth of β-(AlGa)2O3 films has been realized by oxygen radical assisted pulsed laser deposition.

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Cited by 10 publications
(7 citation statements)
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“…As the Al concentration increased, the additional peak at 75 eV appeared, which was considered to be Al-O bonds. 30,45,46 This Al-O peak shied toward the higher binding energy with the Al concentration in the b-Ga 2 O 3 , which was also in good agreement with previous reports. 30,46,47 47 In Fig.…”
Section: Resultssupporting
confidence: 92%
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“…As the Al concentration increased, the additional peak at 75 eV appeared, which was considered to be Al-O bonds. 30,45,46 This Al-O peak shied toward the higher binding energy with the Al concentration in the b-Ga 2 O 3 , which was also in good agreement with previous reports. 30,46,47 47 In Fig.…”
Section: Resultssupporting
confidence: 92%
“…30,45,46 This Al-O peak shied toward the higher binding energy with the Al concentration in the b-Ga 2 O 3 , which was also in good agreement with previous reports. 30,46,47 47 In Fig. 4(c), two O 1s peaks located at 530.2 eV (O I ) and 532.0 eV (O II ) represented the O 2 À ions in the oxygensaturated and oxygen-decient regions, respectively.…”
Section: Resultssupporting
confidence: 92%
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