Low Temperature MOCVDof Conducting, Micrometer-Thick, Silver Films

Samoilenkov, S. V.; Stefan, M.A.; Wahl, G.; Paramonov, S.; Kuzmina, Natalia; Kaul, A.R.

doi:10.1002/1521-3862(20020304)8:2<74::aid-cvde74>3.0.co;2-b

Cited by 24 publications

(8 citation statements)

References 45 publications

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“…[109] Various silver metal-organic compounds have been used in AACVD as precursors for silver and silver-alloy films, such as silver carboxylates, fluoro-X. [109] Various silver metal-organic compounds have been used in AACVD as precursors for silver and silver-alloy films, such as silver carboxylates, fluoro-X.…”

Section: Metallic Filmsmentioning

confidence: 99%

Processing and Applications of Aerosol‐Assisted Chemical Vapor Deposition

Hou

Choy

2006

Chemical Vapor Deposition

225

173

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The aerosol‐assisted (AA) CVD method involves the atomization of a precursor solution into fine, sub‐micrometer‐sized aerosol droplets which are delivered to a heated reaction zone and undergo evaporation, decomposition, and homogeneous and/or heterogeneous chemical reactions to form the desired products. As a variant of conventional CVD processes, AACVD addresses the availability and delivery problems of the chemical precursors. A wide range of precursors can be used since volatility is no longer crucial, offering more possibilities to produce high‐quality CVD products at low cost. Some variants of AACVD have also been developed, such as AA combustion (C) CVD, electrostatic spray‐assisted vapor deposition (ESAVD), and electrostatic‐assisted aerosol jet deposition (EAAJD). These variants provide additional flexibility and capability to the AACVD‐based processes. AACVD‐based processes have attracted increasing interest in most of the CVD‐related areas, and have been widely used to synthesize various films, coatings, powders, composites, nanotubes and nanowires, etc. This review highlights the principles, applications, and recent progress of AACVD‐based processes.

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Section: Metallic Filmsmentioning

confidence: 99%

Processing and Applications of Aerosol‐Assisted Chemical Vapor Deposition

Hou

Choy

2006

Chemical Vapor Deposition

225

173

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“…These are summarized in Figure 7, with the same carried out for a film deposited using 5% H 2 /N 2 for comparison. Previous work 8,44 found that Ag deposition with a small quantity of H 2 assisted in the reduction of halide contamination due to the formation of hydrogen halides, though there was no trace of F in any films deposited here, regardless of carrier gas. In the case of deposition from silver trifluoroacetate, hydrogen fluoride was reported form preferentially over C x H y such that solid C is codeposited with Ag.…”

Section: Blanks Appear In Tablementioning

confidence: 61%

“…12 It is generally expedient for industrially scalable deposition processes to minimize cost by avoiding vacuum deposition methods such as MOCVD and MS; however, atmospheric-pressure thermal CVD (APCVD) of silver films is virtually unheard of due to a lack of available precursors with suitably high vapor pressures. 8 High-performance silver thin films have been deposited at atmospheric pressure using flameassisted CVD (FACVD); 13 however, this technique is typically limited to small-scale sample preparation due to significant temperature variations, and therefore nonuniformity in the deposited films, being intrinsic to the method. 14 Aerosol-assisted chemical vapor deposition (AACVD) is an atmospheric-pressure alternative to thermal APCVD, which avoids the requirement of thermal APCVD that precursors should be appreciably volatile by instead generating an aerosol from a solution of the precursor.…”

Section: Introductionmentioning

confidence: 99%

Reflective Silver Thin Film Electrodes from Commercial Silver(I) Triflate via Aerosol-Assisted Chemical Vapor Deposition

Dixon

Manzi

Powell

et al. 2018

ACS Appl. Nano Mater.

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The growth of metallic silver films by aerosol-assisted chemical vapor deposition at atmospheric pressure for use as thin film electrodes or reflective layers in optoelectronic stacks has been studied using the self-metallization of silver(I) trifluoromethanesulfonate (silver(I) triflate, [Ag(SO3CF3)]) during chemical vapor deposition under nitrogen, air and 5% H2/N2. The deposition behaviour of the triflate from a methanolic solution was observed with respect to film thickness between 170 and 240 nm, while the dependence of electrical resistivity between ρ = 2.8 × 10 0 and 5.0 × 10-5 Ω cm on nanocrystallite diameter between 38 and 44 nm indicated a grain boundary-limited charge carrier propagation mechanism arising from insular film growth. Furthermore, increased nanocrystallite size reduced specular optical reflectance from 11 to 3 %. The thermal stability of silver(I) triflate as compared with other silver precursors enabled deposition at elevated temperatures with maximum growth rates of 11 nm min-1 , representing a manifold increase over many previously reported Ag thin film chemical vapor deposition processes on non-metallic substrates. Nanocrystallite diameter was directly proportional to film thickness, such that control over thickness enabled control over surface texture, electrical resistivity and specular optical reflectivity.

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“…[109][110][111] However, also in wet chemical coating techniques silver carboxylates could be used. Compared to inks based on nanoparticle suspensions they do not contain any solids tending to agglomeration.…”

Section: Metal Organic Precursorsmentioning

confidence: 99%

“…Silver diketonates and silver carboxylates have been developed initially as precursors for CVD processes. [109][110][111] However, also in wet chemical coating techniques silver carboxylates could be used. Since most of these structures are insoluble due to their polymeric or oligomeric structures, Lewis bases such as phosphane, phosphite, bipyrimidine are often added as co-ligands.…”

Section: Nanoparticle Dispersionsmentioning

confidence: 99%

Precursor strategies for metallic nano- and micropatterns using soft lithography

et al. 2015

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Soft lithographic methods describe a set of printing methods which are widely used for the preparation of structured surfaces. Structured surfaces are essential components in the field of (opto-)electronic devices such as organic light emitting diodes, photovoltaics or organic field effect transistors. In recent years, crucial progress has been achieved in the development of patterned metal coatings for these applications. This review focusses on new strategies for soft lithographical printing of metal structures emphasizing the subtle interplay of printing techniques, metal precursor chemistry, and surface functionalization strategies

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Low Temperature MOCVDof Conducting, Micrometer-Thick, Silver Films

Cited by 24 publications

References 45 publications

Processing and Applications of Aerosol‐Assisted Chemical Vapor Deposition

Processing and Applications of Aerosol‐Assisted Chemical Vapor Deposition

Reflective Silver Thin Film Electrodes from Commercial Silver(I) Triflate via Aerosol-Assisted Chemical Vapor Deposition

Precursor strategies for metallic nano- and micropatterns using soft lithography

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