“…Atomic layer deposition is a process based on self-limiting surface-controlled chemical reactions between vaporized precursors and substrate, capable of producing a wide variety of materials comprising sulfides, selenides, tellurides, metals, nitrides, and oxides [ 13 ]. ALD has already been demonstrated for the production of inverse opal photonic crystals (iPhC) made from gallium phosphide [ 14 ], zinc sulfide [ 15 ], tungsten [ 8 ], zinc oxide [ 16 , 17 ], aluminum oxide [ 17 , 18 , 19 ], aluminosilicates [ 20 , 21 ], and titanium oxide [ 17 , 22 , 23 , 24 ]. In particular, the latter one is of interest for optical applications since titania features a relatively high refractive index, often higher than 2.3 at 632.8 nm.…”