1999
DOI: 10.1149/1.1390743
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Low Temperature Nafion Bonding of Silicon Wafers

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Cited by 27 publications
(14 citation statements)
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“…From a standard Nafion liquid dispersion (Nafion DE 521, DuPont), we formed a 0.83% Nafion solution via 1∶5 dilution in 2-propanol. In a modified version of the protocol described in [49] , we used a spin-on process to coat our wafers with the resulting dispersion, spinning the wafers at 750–1000 rpm for 3–10 s. In order to cure the Nafion and facilitate bonding to the substrate [50] , we heated the wafers in a convection oven at 120°C for 20 minutes. This process generates Nafion layers approximately 60–420 nm in thickness, as measured by spectroscopic ellipsometry (Filmetrics, San Diego, California).…”
Section: Methodsmentioning
confidence: 99%
“…From a standard Nafion liquid dispersion (Nafion DE 521, DuPont), we formed a 0.83% Nafion solution via 1∶5 dilution in 2-propanol. In a modified version of the protocol described in [49] , we used a spin-on process to coat our wafers with the resulting dispersion, spinning the wafers at 750–1000 rpm for 3–10 s. In order to cure the Nafion and facilitate bonding to the substrate [50] , we heated the wafers in a convection oven at 120°C for 20 minutes. This process generates Nafion layers approximately 60–420 nm in thickness, as measured by spectroscopic ellipsometry (Filmetrics, San Diego, California).…”
Section: Methodsmentioning
confidence: 99%
“…12 In order to create a hermetic seal between two substrates via an intermediate, a thermal or photo curable resin (thickness at least several microns) is dispensed on one substrate, contacted with another substrate after pre-curing, and cured at temperatures below 300 C. Although spin-on sodium silicate solution (spin-on-glass; SOG) yields good bonds at temperatures in the range 90-200 C, [13][14][15] polymers are mostly used as an intermediate layer, because most polymer-based materials can be patterned photolithographically, which allows localized adhesive bonding. Voidfree, low-temperature adhesive silicon-silicon, glass-glass and silicon-glass bonds are realized with polydimethylsiloxane (PDMS) or its precursor at 60-65 C, 16,17 Nafion (a perfluorinated ion exchange polymer) at 120 C, 18 polyimide, SU-8 and cyclic perfluoropolymer (Cytop) at 150-160 C, [19][20][21][22] and benzocyclobutene (BCB) at 180-270 C, [23][24][25] whereas roomtemperature glass-glass adhesive bonding is possible with UV curable epoxy resins. [26][27][28][29] The quality of the adhesive bond, i.e.…”
Section: Introductionmentioning
confidence: 99%
“…Thirdly, this bonding process remains timeconsuming and labor-intensive and requires the access to dedicate equipment such as clean-room facilities. [8][9][10] Next, direct bonding is mostly applicable for only conventional materials in microfabrication technology, i.e. glass and silicon except for plasma activation used for one polymer, PDMS.…”
Section: Introductionmentioning
confidence: 99%