Low-temperature plasma-chemical synthesis of carbon nanotubes on nickel patterns obtained by the photocatalytic-lithography method

Photocatalytic lithography with image inversion

“…This permits the generation of both negative and positive metallic pictures by varying the irradiation dose, which expands the scope for obtaining planar metallic elements with complex structural organization.The feasibility of the photoselective deposition of catalytic metals such as palladium and silver onto the surface of broad-band oxide semiconductors such as TiO 2 , SnO 2 , and ZnO provides conditions for the subsequent chemical precipitation of another metal onto the exposed segments, which, in turn, permits the formation of various metallic elements such as current-conducting pathways, microelectrode assemblies, and catalytic surfaces for growing carbon nanotubes [1][2][3][4][5]. An important advantage of such photocatalytic lithography is the possibility of obtaining metallic pictures with micron resolution on large-format bases without using photoresists and vacuum spraying.…”