2009
DOI: 10.1063/1.3097806
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Low temperature transport in undoped mesoscopic structures

Abstract: Using high quality undoped GaAs/AlGaAs heterostructures with optically patterned insulation between two layers of gates, it is possible to investigate very low density mesoscopic regions where the number of impurities is well quantified. Signature appearances of the scattering length scale arise in confined two dimensional regions, where the zero-bias anomaly (ZBA) is also observed. These results explicitly outline the molecular beam epitaxy growth parameters necessary to obtain ultra low density large two dim… Show more

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Cited by 21 publications
(20 citation statements)
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“…The second most important are the undesired background (bulk) impurities, which can have a density as low as 1 − 5 × 10 13 cm −3 [119,120], and cause most of the disorder in undoped systems [121]. Surface charges can also induce disorder, and mainly influence shallow (30 − 40 nm deep) 2DEGs.…”
Section: Reducing Disordermentioning
confidence: 99%
“…The second most important are the undesired background (bulk) impurities, which can have a density as low as 1 − 5 × 10 13 cm −3 [119,120], and cause most of the disorder in undoped systems [121]. Surface charges can also induce disorder, and mainly influence shallow (30 − 40 nm deep) 2DEGs.…”
Section: Reducing Disordermentioning
confidence: 99%
“…Fig. 3 a & 3b [3,4,5] show the two known methods of making undoped 2DEGs. However a structure of the type shown in Fig.…”
mentioning
confidence: 99%
“…3a cannot be made very shallow, because the ohmic material (after annealing) is rough and . We have used a two level gating scheme [4,5], (see Fig. 3b) to define point contacts and quantum dots on this wafer(data not shown).…”
mentioning
confidence: 99%
“…Device yield is often low and the devices can suffer from high contact resistance. Another FET design reported in the literature utilizes a lithographically-defined global top-gate deposited on top of insulators such as polyimides [17,[19][20]23], nitrides [24,25] or oxides [26] separating the ohmic contacts from the gate. In this configuration the global top-gate must extend over the ohmic contact pad to ensure a continuous 2DEG to the ohmic contact.…”
mentioning
confidence: 99%
“…Field-effect-induced 2DEG transistors (FETs) in GaAs/AlGaAs heterostructures have been investigated extensively [14][15][16][17][18][19][20][21][22][23][24][25][26][27] and might find utility as a platform to investigate nanoscale phenomena in a low-noise environment if certain limitations can be overcome. The most widely studied device is the heterostructure-insulated-gate field-effect transistor (HIGFET), in which a highly-conducting n+ GaAs gate is grown on top of an insulating Al x Ga 1−x As barrier layer by molecular beam epitaxy (MBE) [14-16, 18, 22].…”
mentioning
confidence: 99%