&lt;title&gt;64-Mbit DRAM production with i-line stepper&lt;/title&gt;

Shirai, Hisatsugu; Kobayashi, Katsuyoshi; Nakagawa, Kenji

doi:10.1117/12.44786

Cited by 5 publications

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“…The rim shifted space [1][2][3][4][5][6][7] is one possible phase shift technique. This feature is obtained by adding a phase shifted rim to the edges of a standard space.…”

Section: Designing the Experimentsmentioning

confidence: 99%

Response surface modeling of rim phase-shift masks

1993

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The use of statistically designed experiments provide an efficient method of investigating a lithographic process. Lithographic simulators have also been used as a tool in the investigation of these processes. This paper provides a general methodology for conducting designed experiments in which a computer simulator is the tool used as the data collection device. The rim shifter is a phase shifting technique that was investigated. Response surfaces measuring depth of focus were generated from simulated data. The resolution and depth of focus capabilities of this phase shift technique were also measured by both experimental and simulated data

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“…The rim shifted space [1][2][3][4][5][6][7] is one possible phase shift technique. This feature is obtained by adding a phase shifted rim to the edges of a standard space.…”

Section: Designing the Experimentsmentioning

confidence: 99%

Response surface modeling of rim phase-shift masks

1993

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Photolithography

Leuschner

Pawlowski²

2013

Materials Science and Technology

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The sections in this article are Introduction Exposure Tools Image Formation and Resolution Contact and Proximity Printing Optical Mask Aligner X‐Ray Stepper Projection Printing Near UV Projection Systems Deep UV Projection Systems Nonconventional UV Lithography Post‐Optical Lithography Photoresist Processing Quality Control and Resist Deposition Purity and Storage Stability Resist Coating Resist Exposure and Development Characteristic Curve and Standing Wave Effects Process Latitudes Dissolution Rate and Development Methods Pattern Inspection and Resist Profile Simulation Etching, Resist Stripping and Planarization Photoresists Principles of Photoresist Chemistry Negative‐Tone Resists Photocrossslinking Via Azides Free‐Radical‐Initiated Polymerization Acid‐Catalyzed Crosslinking Positive‐Tone Resists Dissolution Inhibition/Dissolution Promotion Acid‐Catalyzed Deblocking Polymer Degradation Solvents for Photoresists and Main Resist Suppliers Special Photoresist Techniques Nonconventional Diazo Resist Processes Resist Profile Modification and Image Reversal Bilayer Systems for Contrast Enhancement Suppression of Reflections and Standing Wave Effects Dyed Resists Antireflective Layers Silicon‐Containing Multilayer Resists Negative‐Tone Silicon Bilayer Resists Positive‐Tone Silicon Bilayer Resists Top Surface Imaging Gas Phase Silylation Systems Liquid Phase Silylation Systems Trends in Photolithography

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Photolithography

Leuschner

Pawlowski²

2000

Handbook of Semiconductor Technology Set

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<title>64-Mbit DRAM production with i-line stepper</title>

Cited by 5 publications

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Response surface modeling of rim phase-shift masks

Response surface modeling of rim phase-shift masks

Photolithography

Photolithography

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