Abstract:For the near future generations of lithography we investigate the reticle measurements of contact holes with respect to their lithographic performance. The difficulty with the shrinking size of contact holes is that their X and/or Y measurement on reticle does not correlate with the lithographic results. The shape of the contact hole will have a large impact. This paper considers the several types of reticle SEM measurement on isolated contact holes, the simulations on asymmetric contact holes, reticle photo a… Show more
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