2001
DOI: 10.1117/12.436678
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<title>Development of data conversion system for electron-beam projection lithography (EPL) mask</title>

Abstract: Electron beam (EB) lithography has long been used for fabricating advanced ULSIs. Recently, to increase the writing throughput, electron beam projection lithography (EPL) technology has been proposed (100kV acceleration voltage and 20-30µA total currents). When we implement this technology to mass production, the data conversion system and EPL mask, which is different from conventional optical mask, have to be developed.In EPL mask conversion system, it is necessary to divide a full chip data into 1mmb1mm (250… Show more

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