“…Oxygen is a dominant residual impurity in GaP crystals grown by LEC method of the Zn Ga shallow acceptor and Sn Ga shallow donor equal to 69.7 meV and 72 meV, respectively [8]. It should be noted that both zinc and tin are known to be background impurities frequently occurring in GaP crystals grown by the LEC method [2,17,21].The shallow traps TB2 (85 meV), TB3 (95 meV) and TA7 (110 meV) are likely to be attributed to shallow donors formed by residual silicon atoms in the gallium sublattice, tellurium atoms in the phosphorus sublattice and sulphur atoms in the phosphorus sublattice, the ionization energies of which are 85 meV, 93 meV and 105 meV, respectively [8,9,18]. On the grounds of the reported experimental data [10][11][12]15,…”