&lt;title&gt;Evaluation and comparison of the pattern-transfer-induced image placement distortions on e-beam projection lithography masks&lt;/title&gt;

Magg, Christopher; Lercel, Michael J.; Lawliss, Mark; Ackel, Robin; Caldwell, Neal; Kindt, Louis; Racette, Kenneth C.; Williams, Carey T.; Reu, Phillip L.

doi:10.1117/12.436664

Cited by 5 publications

(3 citation statements)

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“…[6,12] Some results were not surprising, such as higher pattern density resulting in larger process induced distortion. Contact levels with low pattern density have much less distortion than gate or wiring levels.…”

Section: Pattern and Materials Requirementsmentioning

confidence: 91%

“…The continuous membrane scatterer layers consisted of a TaSi layer etched using the ebeam resist as the masking layer. [6] Metrology is critical to NGL mask fabrication. At the MCoC, masks are inspected and measured with SEM (including transmission detection), image placement metrology, and defect inspection with both optical and e-beam inspection systems.…”

Section: Mask Fabricationmentioning

confidence: 99%

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Analysis of critical parameters for EPL mask fabrication

Lercel¹

2002

Emerging Lithographic Technologies VI

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Electron projection lithography (EPL) requires mask formats that are significantly different from those used in traditional optical lithography. These masks must consist of a thin membrane that is either patterned with transmissive perforations for stencil masks or patterned with a scatterer layer to form a continuous membrane mask. In this paper, the critical requirements for fabrication of EPL masks are discussed. Challenges for mask blank fabrication, image size uniformity, image placement accuracy, and defect control are presented with examples from mask fabrication. The impact of these parameters on EPL mask cost is then discussed. The mask cost is compared for different critical device levels and for different chip sizes. The influence of mask parameters and need for complementary masks drives higher mask costs for certain device levels. By examining the factors influencing mask cost for certain levels, the areas of mask technology that are most critical to controlling mask cost can be identified.

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Section: Pattern and Materials Requirementsmentioning

confidence: 91%

Section: Mask Fabricationmentioning

confidence: 99%

Analysis of critical parameters for EPL mask fabrication

Lercel¹

2002

Emerging Lithographic Technologies VI

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“…To fully evaluate the benefit of the lower stress silicon substrates in relation to image placement improvements, the dense half pattern was used. In past publications, the dense half pattern has been shown to be the worst case scenario for image placement distortion in EPL masks [6]. Image placement distortions for this type of membrane have a significant delta between the x and y-components due to the pattern density gradient.…”

Section: Mask Patterning and Metrologymentioning

confidence: 99%

Image Placement Distortions in EPL Masks

Thiel¹,

Kindt²,

Lawliss³

2002

SPIE Proceedings

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Electron projection lithography (EPL) is a promising candidate for the next generation lithography choice. There are several advantages to EPL, such as a large depth of focus and a lower relative mask cost. Significant challenges also face this technology, including the limitation of the membrane format of the mask. One of the obstacles with the membrane format is image placement distortions, which can be very sensitive to the stress of the membrane as well as the pattern density. This paper studies how the stress of various types of films effects image placement distortions, as well as examines the effect of final mask cleans on image placement distortions.

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Bibliography (1994–2004) of other topics

Mackerle¹

2004

Modelling Simul. Mater. Sci. Eng.

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<title>Evaluation and comparison of the pattern-transfer-induced image placement distortions on e-beam projection lithography masks</title>

Cited by 5 publications

References 0 publications

Analysis of critical parameters for EPL mask fabrication

Analysis of critical parameters for EPL mask fabrication

Image Placement Distortions in EPL Masks

Bibliography (1994–2004) of other topics

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