&lt;title&gt;High-power x-ray point source for next-generation lithography&lt;/title&gt;

Turcu, I. C. Edmond; Forber, R. A.; Grygier, R. K.; Rieger, Harry; Powers, Michael F.; Campeau, S. M.; French, G.; Foster, Richard M.; Mitchell, P.V.; Gaeta, C. J.; Cheng, Zhaochen; Burdett, Jay; Gibson, D. M.; Lane, Stephen M.; Barbee, Troy W.; Mrowka, Stanley; Maldonado, Juan R.

doi:10.1117/12.371118

Cited by 10 publications

(4 citation statements)

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“…Table top sub-Joule laser systems are capable of accessing this intensity range at kHz repetition rates and can produce bright thermal sources of keV line radiation (e.g. Al He-α resonance line [1s 2 -1s2p 1 P] at 1.6keV) with conversion efficiencies from optical photons of ~ 4% [1]. Thermal x-rays are emitted isotropically with the duration of the emission limited by the plasma cooling time which can be as short as 10ps but is typically much longer [2].…”

Section: Thermal Sourcesmentioning

confidence: 99%

“…As in figure two the predicted outputs from a number of X-ray FEL facilities are shown. For comparison, the average brightness of the 7Hz fast capillary discharge x-ray laser [39] is shown along with a 300Hz laser-plasma thermal source [1]. The error bar for the FCD x-ray laser reflects expected improvements in output [45].…”

Section: Comparitive Peak and Average Spectral Brilliance Of Synchrotmentioning

confidence: 99%

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<title>Properties and applications of laser-generated x-ray sources</title>

Smith

Key

2001

SPIE Proceedings

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The rapid development of laser technology and related progress in research using lasers is shifting the boundaries where laser based sources are preferred over other light sources particularly in the XUV and x-ray spectral region. Laser based sources have exceptional capability for short pulse and high brightness and with improvements in high repetition rate pulsed operation, such sources are also becoming more interesting for their average power capability. This study presents an evaluation of the current capabilities and near term future potential of laser based light sources and summarises, for the purpose of comparison, the characteristics and near term prospects of sources based on synchrotron radiation and free electron lasers. Conclusions are drawn on areas where the development of laser based sources is most promising and competitive in terms of applications potential.

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Section: Thermal Sourcesmentioning

confidence: 99%

Section: Comparitive Peak and Average Spectral Brilliance Of Synchrotmentioning

confidence: 99%

<title>Properties and applications of laser-generated x-ray sources</title>

Smith

Key

2001

SPIE Proceedings

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“…In particular, for microelectronics and nanomechanics applications, the use of EUV or XUV radiation allows to reach sub-100 nm resolution values 1,2 , that is much beyond the values actually achieved in industrial production systems by using visible light or UV radiation (around 180 nm). Laser plasma sources are at the moment the most powerful ones in the EUV range 3,4,5 . The higher conversion efficiency from laser to EUV radiation is obtained by solid targets with UV lasers 6 , but unfortunately in this case a serious problem for the delicate optics rises from the emission of debris and ions from the source 7 .…”

Section: Introductionmentioning

confidence: 99%

<title>Krypton as filter for ions, debris, and useless radiation in EUV projection lithography systems</title>

et al. 2001

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The life time of the first multilayer mirror (the condenser) in optical systems for projection Extreme Ultra-Violet (EUV) lithography based on Laser Produced Plasmas (LPP) is limited both by the debris bombardment and by the EUV radiation photoablation. These problems can be dramatically reduced by using krypton as debris stopper, exploiting its high atomic weight (21 times the helium value) and its high transparency in the EUV region only between 60 and 90 eV. We demonstrate both theoretically and experimentally that by filling the laser-target interaction chamber with krypton at low pressure (a few mbar) it is possible to stop efficiently the small debris (having a size smaller than 1 micron, including ions, neutrals and clusters) while keeping a reasonable transmission of the EUV radiation in the 60-90 eV range (> 80%). In particular, this is experimentally demonstrated for a solid target LPP based on a tantalum or copper tape target and pumped by a large energy (4 J -120 ns) XeCl excimer laser. The poor transmission of krypton, out of the above mentioned spectral window, significantly reduces the exposition of the condenser mirror to useless radiation. This new technique for stopping the debris has recently been patented by our group. As far as the larger size debris is regarded, a dramatic reduction of their flux has been obtained by decreasing the laser intensity on the target, still keeping a laser to EUV energy conversion as high as 0.7%/eV/sr at 70 eV, from a Ta target, together with a shot to shot EUV pulse energy stability better than 1%.

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“…Laser plasma sources are at the moment the most powerful in the EUV range [3][4][5]. The higher conversion efficiency from laser to EUV radiation is obtained by solid targets with UV lasers [6], but unfortunately in this case a serious problem for the delicate optics rises from the emission of debris and ions from the source [7].…”

mentioning

confidence: 99%

Krypton as stopper for ions and small debris in laser plasma sources

et al. 2001

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A preliminary theoretical and experimental demonstration of the successful use of krypton as stopper for ions and small debris (Φ < 1 µm) in laser plasma sources is discussed. In particular, for applications to projection micro-lithography at hν = 60-90 eV, an ions rejection by almost 2 orders of magnitude is obtained at a Kr pressure compatible for more than 80% transmission of the EUV radiation.

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<title>High-power x-ray point source for next-generation lithography</title>

Cited by 10 publications

References 0 publications

<title>Properties and applications of laser-generated x-ray sources</title>

<title>Properties and applications of laser-generated x-ray sources</title>

<title>Krypton as filter for ions, debris, and useless radiation in EUV projection lithography systems</title>

Krypton as stopper for ions and small debris in laser plasma sources

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