<title>Influence of additional rf discharge on the properties of carbon nitride thin films deposited by PLD</title>

Abstract

Nitrogen-rich carbon nitride films were prepared by pulsed laser deposition (PLD) combined with additional r. f. and hollow cathode discharges on fused silica, stainless steel and silicon substrates. The properties of combination of laser plasma with concentrated r.f. or HC discharges were studied using an optical emission spectroscopy (OES). The composition of the films was measured by WDX method. The transmission spectra and plastic microhardnes of the films were also measured.