1998
DOI: 10.1117/12.324399
|View full text |Cite
|
Sign up to set email alerts
|

<title>Noncontact surface potential measurements for charging reduction during TEOS deposition and ion implantation</title>

Abstract: In this paper we investigate the possibility of using non-contact surface potential measurements (SPM) to study charging during plasma enhanced CVD TEOS deposition and high current ion implantation. It is found that SPM can be used for a first order and fast-feedback assessment of new recipes and tools as well as for routine monitoring of plasma damaging processes.

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...

Citation Types

0
0
0

Year Published

1999
1999
1999
1999

Publication Types

Select...
1

Relationship

0
1

Authors

Journals

citations
Cited by 1 publication
references
References 2 publications
0
0
0
Order By: Relevance