&lt;title&gt;Progress in Mo/Si multilayer coating technology for EUVL optics&lt;/title&gt;

Louis, Eric; Yakshin, Andrey; Goerts, Peter C.; Oestreich, Sebastian; Stuik, Remko; Maas, Edward L. G.; Kessels, M. J. H.; Bijkerk, F.; Haidl, Markus; Muellender, S.; Mertin, M.; Schmitz, D.; Scholze, Frank; Ulm, G.

doi:10.1117/12.390077

Cited by 45 publications

(14 citation statements)

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“…The ML with suitable varying periodicity will be used for potential application in the wavelength range of 126-150Å. The 63% of reflectivity obtained is comparable with 69% peak reflectance reported on standard Mo/Si system [24]. The spectral width of ML-3 is 2.3 eV.…”

Section: Soft X-ray Performancesupporting

confidence: 55%

Fabrication and Evaluation of Large Area Mo/Si Soft X-Ray Multilayer Mirrors at Indus SR Facilities

Rao

Nayak

Lodha

et al. 2012

Advances in Optical Technologies

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Large area Mo/Si multilayer (ML) mirrors with high reflectivity are fabricated using magnetron sputtering deposition system. Thin film growth is optimized for film roughness, density, and interface quality by changing process parameters through fabrication of thin films. Mo/Si MLs are fabricated with varying thickness ratio, number of layer pairs, and periodicity from 0.3 to 0.45, 5 to 65, and 40 to 100 Å, respectively. The samples are characterized using hard X-ray reflectivity and transmission electron microscopy. Soft X-ray performance tests of MLs are done by soft X-ray reflectivity using Indus-1 synchrotron radiation. ML coating with thickness errors of ~0.03% per layer and interface roughness in the range of 2 to 5 Å has been realized. The lateral variation of the periodicity is controlled within 0.5 Å over the mm2 area of the plane substrate by using substrate motion and appropriate masking arrangement. Maximum variation of periodicity from run to run is less than 0.5 Å. Peak reflectivity of ~63% at wavelength of ~127 Å is achieved for incident angle of 71 degree.

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Section: Soft X-ray Performancesupporting

confidence: 55%

Fabrication and Evaluation of Large Area Mo/Si Soft X-Ray Multilayer Mirrors at Indus SR Facilities

Rao

Nayak

Lodha

et al. 2012

Advances in Optical Technologies

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“…We investigated a Mo/Si multilayer coating, deposited on superpolished Si substrate, a typical mirror as used for XUV lithography. The multilayer was deposited by e-beam evaporation in a UHV background of 1 × 10 −8 mbar, with post-deposition smoothing using low energy ion treatment [31][32][33][34][35]. The sample was pre-characterized by means of x-ray and XUV reflectometry.…”

Section: Methodsmentioning

confidence: 99%

Single shot damage mechanism of Mo/Si multilayer optics under intense pulsed XUV-exposure

Khorsand¹,

Sobierajski²,

Louis³

et al. 2010

Opt. Express

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We investigated single shot damage of Mo/Si multilayer coatings exposed to the intense fs XUV radiation at the Free-electron LASer facility in Hamburg - FLASH. The interaction process was studied in situ by XUV reflectometry, time resolved optical microscopy, and "post-mortem" by interference-polarizing optical microscopy (with Nomarski contrast), atomic force microscopy, and scanning transmission electron microcopy. An ultrafast molybdenum silicide formation due to enhanced atomic diffusion in melted silicon has been determined to be the key process in the damage mechanism. The influence of the energy diffusion on the damage process was estimated. The results are of significance for the design of multilayer optics for a new generation of pulsed (from atto- to nanosecond) XUV sources.

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“…The MoN/SiN multilayer coatings used in this work have been deposited on superpolished Si substrates using e-beam evaporation of Mo atoms and magnetron sputtering of Si atoms in a UHV background of 1×10 8 mbar, with post-deposition smoothing using low energy ion treatment of the Si layers [15][16][17][18]. Nitridation of the Mo and Si layers was achieved by low energy nitrogen ion treatment during deposition [19][20][21].…”

Section: Methodsmentioning

confidence: 99%

Damage mechanisms of MoN/SiN multilayer optics for next-generation pulsed XUV light sources

Sobierajski¹,

Bruijn²,

Khorsand³

et al. 2010

Opt. Express

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Abstract:We investigated the damage mechanism of MoN/SiN multilayer XUV optics under two extreme conditions: thermal annealing and irradiation with single shot intense XUV pulses from the free-electron laser facility in Hamburg -FLASH. The damage was studied "post-mortem" by means of X-ray diffraction, interference-polarizing optical microscopy, atomic force microscopy, and scanning transmission electron microscopy. Although the timescale of the damage processes and the damage threshold temperatures were different (in the case of annealing it was the dissociation temperature of Mo 2 N and in the case of XUV irradiation it was the melting temperature of MoN) the main damage mechanism is very similar: molecular dissociation and the formation of N 2 , leading to bubbles inside the multilayer structure. E. van Dorssen, and H. A. Padmore, "Enhancement of reflectivity of multilayer mirrors for soft X-ray projection lithography by temperature optimization and ion bombardment," Microelectron. Eng. ©2010 Optical Society of America

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<title>Progress in Mo/Si multilayer coating technology for EUVL optics</title>

Cited by 45 publications

References 0 publications

Fabrication and Evaluation of Large Area Mo/Si Soft X-Ray Multilayer Mirrors at Indus SR Facilities

Fabrication and Evaluation of Large Area Mo/Si Soft X-Ray Multilayer Mirrors at Indus SR Facilities

Single shot damage mechanism of Mo/Si multilayer optics under intense pulsed XUV-exposure

Damage mechanisms of MoN/SiN multilayer optics for next-generation pulsed XUV light sources

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