&lt;title&gt;Resist design for dry-developed positive working systems in deep-UV and e-beam lithography&lt;/title&gt;

Vinet, F.; Chevallier, Michele; Pierrat, Christophe; Guibert, Jean Charles; Rosilio, C.; Mouanda, B.; Rosilio, A.

doi:10.1117/12.46404

Advances in Resist Technology and Processing VIII

1991

DOI: 10.1117/12.46404

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<title>Resist design for dry-developed positive working systems in deep-UV and e-beam lithography</title>

F. Vinet¹,

Michele Chevallier²,

Christophe Pierrat³

et al.

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<title>Resist design for dry-developed positive working systems in deep-UV and e-beam lithography</title>

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