&lt;title&gt;Response surface modeling utilizing lithographic process simulation&lt;/title&gt;

Smith, Bruce W.; Shiao, Wai-Man; Holscher, Richard D.; Mahoney, Patricia F.

doi:10.1117/12.59829

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Designing the Experiments1

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1993

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“…The rim shifted space [1][2][3][4][5][6][7] is one possible phase shift technique. This feature is obtained by adding a phase shifted rim to the edges of a standard space.…”

Section: Designing the Experimentsmentioning

confidence: 99%

Response surface modeling of rim phase-shift masks

1993

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The use of statistically designed experiments provide an efficient method of investigating a lithographic process. Lithographic simulators have also been used as a tool in the investigation of these processes. This paper provides a general methodology for conducting designed experiments in which a computer simulator is the tool used as the data collection device. The rim shifter is a phase shifting technique that was investigated. Response surfaces measuring depth of focus were generated from simulated data. The resolution and depth of focus capabilities of this phase shift technique were also measured by both experimental and simulated data

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“…The rim shifted space [1][2][3][4][5][6][7] is one possible phase shift technique. This feature is obtained by adding a phase shifted rim to the edges of a standard space.…”

Section: Designing the Experimentsmentioning

confidence: 99%