2005
DOI: 10.1117/12.639165
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<title>Sol-gel processed iron-containing silica films on Si</title>

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Cited by 4 publications
(17 citation statements)
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“…The coating solution was deposited on n-Si (0.5 Ωcm) wafers by spinning at 2500 rpm. The structure composed of hybrid material, i. e., Fe clusters imbedded in silica, were dried in air at 95 • C for 0.5 h and annealed in H 2 ambient at 550 • C for 2 h. As it has been concluded previously [6], annealing in H 2 ambient favours formation of small Fe-containing nanoparticles with prevailing composition of pure Fe.…”
Section: Methodsmentioning
confidence: 99%
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“…The coating solution was deposited on n-Si (0.5 Ωcm) wafers by spinning at 2500 rpm. The structure composed of hybrid material, i. e., Fe clusters imbedded in silica, were dried in air at 95 • C for 0.5 h and annealed in H 2 ambient at 550 • C for 2 h. As it has been concluded previously [6], annealing in H 2 ambient favours formation of small Fe-containing nanoparticles with prevailing composition of pure Fe.…”
Section: Methodsmentioning
confidence: 99%
“…The samples (SiO 2 :Fe) / Si were prepared by sol-gel spin-on technique described elsewhere [6]. The precursor was made by mixing the solution of Fe compound with either freshly prepared colloidal tetraethoxysilane (TEOS) ethanol solution ("one-pot" reaction, 1-type samples) or with a structurized TEOS sol ("two-pots" reaction, 2-type samples).…”
Section: Methodsmentioning
confidence: 99%
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“…Silica layers of controlled porosity were produced on Si wafers by varying the technological procedure [7]. It was found that physical properties of hybrid samples containing Fe/Fe-O particles in silica on Si depended critically on the chemical composition of precursors (FeCl 3 and Fe(CH 3 COO) 3 ) [8], technological procedure ("one-pot" and "two-pots" technique) [9], as well as on the post-growth thermal treatment in various atmospheres (air, Ar, and H 2 ) [7]. The magnetic properties were mostly expressed in the SiO 2 :Fe/SiO 2 /Si samples annealed in hydrogen [8].…”
Section: Introductionmentioning
confidence: 99%