1993
DOI: 10.1117/12.138557
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<title>Synthetic phase holograms written by laser lithography</title>

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“…The photoresist volume does not change during the thermal reflow process based on mass conservation. From equations ( 5) and ( 6), the hexagonal photoresist thickness is numerically determined (t n ) using equation (7). This numerical method can find its accurate solution as enough finite elements are divided.…”
Section: Theoretical Modelsmentioning
confidence: 99%
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“…The photoresist volume does not change during the thermal reflow process based on mass conservation. From equations ( 5) and ( 6), the hexagonal photoresist thickness is numerically determined (t n ) using equation (7). This numerical method can find its accurate solution as enough finite elements are divided.…”
Section: Theoretical Modelsmentioning
confidence: 99%
“…The critical angle becomes smaller than that on the naked substrate after the thermal reflow process because of the base layer below the photoresist cylinders. This method can fabricate a lower numerical lens aperture in the photoresist compared with a microlens on a glass substrate [7]. A microlens fabrication process capable of producing high quality microlens using standard IC processing materials has been developed.…”
Section: Introductionmentioning
confidence: 99%