Machine Learning in VLSI Computer-Aided Design 2019
DOI: 10.1007/978-3-030-04666-8_4
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Machine Learning in Physical Verification, Mask Synthesis, and Physical Design

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Cited by 6 publications
(2 citation statements)
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“…In 2017, Majd and Safabakhsh attempted to group ML applications in museums into art authentication, commercial recommendations, guiding, three-dimensional virtual reality, data analysis, ticketing, and museum layout [55]. Consequently, it is important to improve the problem of ELP by utilizing new technologies such as automating layout [42], ML [56][57][58][59], big data analysis [60], etc.…”
Section: Discussionmentioning
confidence: 99%
“…In 2017, Majd and Safabakhsh attempted to group ML applications in museums into art authentication, commercial recommendations, guiding, three-dimensional virtual reality, data analysis, ticketing, and museum layout [55]. Consequently, it is important to improve the problem of ELP by utilizing new technologies such as automating layout [42], ML [56][57][58][59], big data analysis [60], etc.…”
Section: Discussionmentioning
confidence: 99%
“…An essential first step in increasing manufacturability and reducing costs is the early discovery of lithography hotspots [5]. Although it takes a while, lithography simulation is accurate for hotspot identification.…”
Section: Machine Learning Applied In Mask/wafer Hotspot Detectionmentioning
confidence: 99%