2008
DOI: 10.1007/s00339-008-4910-7
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Magnetic-dichroism study of iron silicides formed at the Fe/Si(100) interface

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Cited by 8 publications
(5 citation statements)
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“…This conclusion agrees well with the results from [9][10][11]. The spectrum recorded after the deposition of iron also agrees with the data reported in [12,13]. Apart from the bulk component, this spectrum has new components induced by the formation of interfacial silicide FeSi (mode I, binding energy of 99.57 eV), sili cide Fe 3 Si (mode C, 98.92 eV), and silicon segregated onto its surface (mode S, 98.65 eV).…”
Section: Resultssupporting
confidence: 95%
See 1 more Smart Citation
“…This conclusion agrees well with the results from [9][10][11]. The spectrum recorded after the deposition of iron also agrees with the data reported in [12,13]. Apart from the bulk component, this spectrum has new components induced by the formation of interfacial silicide FeSi (mode I, binding energy of 99.57 eV), sili cide Fe 3 Si (mode C, 98.92 eV), and silicon segregated onto its surface (mode S, 98.65 eV).…”
Section: Resultssupporting
confidence: 95%
“…It should also be noted that components A and S of the spectrum disappear after this annealing, which indicates the disappearance of a cobalt film on the sample surface. Note that the sili cide formation in this system in the temperature range under study proceeds according to the scenario that takes place in the binary Fe/Si(100) system [13]. Thus, this process is localized in the region of reactivity of the Fe/Si interface, and cobalt existing in the system only weakly affects this process.…”
Section: Resultsmentioning
confidence: 95%
“…Each Fe site provides six 3p states, the configuration of which depends, inter alia, on spin‐orbit coupling and spin polarization (see Figure S7, Supporting Information). [ 14–16 ] Thus, the chemical shift of 3p states results from charge redistribution caused by the rearrangement of chemical bonds (reduction of iron oxide). [ 14 ]…”
Section: Resultsmentioning
confidence: 99%
“…41,42 Ordered iron silicides, including Fe 3 Si, are known to form on silicon substrates when a thin Fe layer is deposited on a Si(100) surface. 43,44 Si segregation in Fe-Si alloys has been observed, which can result in ordered Fe 3 Si or FeSi at the surface. 45 DFT-GGA calculations also predicted Si segregation to Fe 3 Si surfaces.…”
Section: Introductionmentioning
confidence: 99%
“…Iron silicides have a wide range of potential applications due to a diverse set of unusual properties: optical properties of FeSi 2 conducive to thin-film electronic devices, high hardness and corrosion resistance of Fe 3 Si, and giant magnetoresistance exhibited in Fe 3 Si/FeSi multilayers. , Ordered iron silicides, including Fe 3 Si, are known to form on silicon substrates when a thin Fe layer is deposited on a Si(100) surface. , Si segregation in Fe−Si alloys has been observed, which can result in ordered Fe 3 Si or FeSi at the surface . DFT-GGA calculations also predicted Si segregation to Fe 3 Si surfaces .…”
Section: Introductionmentioning
confidence: 99%