Magnetic field induced electron temperature inhomogeneity effects on discharge properties in cylindrical capacitively coupled plasmas

Dahiya, Swati; Singh, Pawandeep; Das, Satadal; Sirse, Nishant; Karkari, S. K.

doi:10.1016/j.physleta.2023.128745

Cited by 6 publications

(1 citation statement)

References 79 publications

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“…The cavity structure of the capacitively coupled plasma (CCP) source is simple and can generate a large area of uniform plasma. [ 1,2 ] Therefore, it is widely used in material surface modification, plasma medicine, microelectronic etching, thin film deposition, sputtering, and other fields of industrial technology. [ 3–9 ] Plasma simulation calculations can provide comprehensive and detailed information on the parameters of the system, validating and complementing experimental diagnostics.…”

Section: Introductionmentioning

confidence: 99%

Impedance matching design of capacitively coupled plasma with fluid and external circuit coupled model

Zhao,

Yu,

Wang

et al. 2024

Plasma Processes & Polymers

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This paper establishes a fully self‐consistent coupled model of fluid and external circuits. The Kirchhoff equation, the charge conservation equation, and Poisson equation are coupled via boundary conditions and integrated into the fluid model for iterative parameter solution. On the basis of this model, we investigate the influence of impedance matching on single‐frequency capacitively coupled plasma characteristics under different parameters and topological structures. The findings suggest that after several iterations the matching parameters converge. Using different initial circuit parameters, the adjustable capacitance and inductance are eventually adjusted to approximately equal values, resulting in the same optimal matching state, whereas diverse discharge parameters led to different outcomes. Under fixed parameters for two topologies, the power absorption efficiency increases, and the reflection coefficient approaches zero, and the best matching is found. This model can be extended to different fluid programs to investigate the impact of complex external circuits with impedance matching network on plasma discharge while simultaneously seeking best impedance matching.

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Section: Introductionmentioning

confidence: 99%

Impedance matching design of capacitively coupled plasma with fluid and external circuit coupled model

Zhao,

Yu,

Wang

et al. 2024

Plasma Processes & Polymers

View full text Add to dashboard Cite

show abstract

Effect of multi-cusp magnetic fields to generate a high-density hydrogen plasma inside a low pressure H2 cylindrical hollow cathode discharge

Islam,

Uchida,

Schulze

et al. 2024

Vacuum

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Discharge characteristics of a low-pressure geometrically asymmetric cylindrical capacitively coupled plasma with an axisymmetric magnetic field

Dahiya,

Singh,

Patil

et al. 2023

Physics of Plasmas

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We investigate the discharge characteristics of a low-pressure geometrically asymmetric cylindrical capacitively coupled plasma discharge with an axisymmetric magnetic field generating an E × B drift in the azimuthal direction. Vital discharge parameters, including electron density, electron temperature, DC self-bias, and electron energy probability function (EEPF), are studied experimentally for different magnetic field strength (B) values. A transition in the plasma parameters is observed for a specific range of magnetic fields where the discharge is highly efficient with lower electron temperature. Outside this range of magnetic field, the plasma density drops, followed by an increase in the electron temperature. The observed behavior is attributed to the transition from geometrical asymmetry to magnetic field-associated symmetry due to reduced radial losses and plasma confinement in the peripheral region. The DC self-bias increases almost linearly from a large negative value to nearly zero, i.e., it turns into a symmetric discharge. The EEPF undergoes a transition from bi-Maxwellian for unmagnetized to Maxwellian at intermediate B and finally becomes a weakly bi-Maxwellian at higher values of B. The above transitions present a novel way to independently control the ion energy and ion flux in a cylindrical capacitively coupled plasma system using an axisymmetric magnetic field with an enhanced plasma density and lower electron temperature that is beneficial for plasma processing applications.

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Magnetic field induced electron temperature inhomogeneity effects on discharge properties in cylindrical capacitively coupled plasmas

Cited by 6 publications

References 79 publications

Impedance matching design of capacitively coupled plasma with fluid and external circuit coupled model

Impedance matching design of capacitively coupled plasma with fluid and external circuit coupled model

Effect of multi-cusp magnetic fields to generate a high-density hydrogen plasma inside a low pressure H2 cylindrical hollow cathode discharge

Discharge characteristics of a low-pressure geometrically asymmetric cylindrical capacitively coupled plasma with an axisymmetric magnetic field

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