Magnetic force assisted thermal nanoimprint lithography (MF-TNIL) for cost-effective fabrication of 2D nanosquare array

Abstract

The work presented here describes a simple, low-cost, and unconventional technique to fabricate a 2D nanosquare array using magnetic force assisted thermal nanoimprint lithography (MF-TNIL). The nanofabrication process involves two steps: (i) fabrication of a 2D nanosquare array template on a laminated plastic sheet via sequential thermal nanoimprinting of linear nanograting polydimethylsiloxane (PDMS) stamp, and (ii) reversal imprinting of template on UV curable polymer using soft UVnanoimprint lithography. Without using an expensive nanofabrication tool, our proposed technique can fabricate nanosquare array over an area of 1×1 cm 2 with individual nanosquare having a feature size of about 383 nm×354 nm×70 nm. We believe that our proposed MF-TNIL represents a promising nanofabrication technique that will allow fabricating various types of nanostructures for their applications in developing sensors, anti-reflective surfaces, self-cleaning surfaces, etc. OPEN ACCESS RECEIVED

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