In a new approach, we have fabricated 6:1 aspect ratio magnetic nanocolumns, 60-250 nm in diameter, embedded in a hard aluminum-oxide/gallium-arsenide (Al 2 O 3 /GaAs) substrate. The fabrication technique uses the highly selective etching properties of GaAs and AlAs, and highly efficient masking properties of Al 2 O 3 to create small diameter, high aspect ratio holes. Nickel ͑Ni͒ is subsequently electroplated into the holes, followed by polishing, which creates a smooth and hard surface appropriate for future reading and writing of the columns as individual bits for high density information storage. We have used magnetic force microscopy and scanning magneto-resistance microscopy to characterize the resulting magnets. We find the columns more magnetically stable than previously achieved with magnets embedded in a SiO 2 substrate. Such stability is necessary before further writing of perpendicular patterned media can be demonstrated.