Magnetic properties of cobalt films at the initial stage of ion-beam deposition

Stognij, A. I.; Meshcheryakov, V. F.; Новицкий, Н. Н.; Fettar, F.; Pashkevich, M. V.

doi:10.1134/s1063785009060145

Cited by 7 publications

(4 citation statements)

References 6 publications

Supporting

Mentioning

Contrasting

Unclassified

Order By: Relevance

“…To explain the formation of a high-quality continuous metal film on the substrate’s surface, the flux of the sputtered metal atoms can be conditionally divided into two parts: main and high-energy [ 24 , 25 ]. The main part consists of the atoms with an average energy that is approximately equal to the sublimation energy U (for beryllium and gold ≈ 3–4 eV/atom) and the high-energy part includes the atoms with an energy of more than 40 eV, i.e., an order of magnitude higher than U [ 46 , 48 ]. The integration of the energy spectrum of the sputtered atoms (7) over energy up to the highest energy E max gives an estimate of the relative number of the sputtered atoms with energies up to 40 eV of a little more than 70% ( Figure 8 a,e).…”

Section: Resultsmentioning

confidence: 99%

“…High energy atoms pass through the remaining part of the layer after sputtering at the substrate–film interface and reach the near-surface layer of the substrate, forming point defects there in addition to the existing point defects that were introduced during the previous deposition. They lead to improved adhesion [ 24 , 25 , 48 ] due to the formation of additional physical bonds between the implanted and deposited metal atoms. This ensures the formation on the substrate of a continuous metal layer with a thickness of several atomic layers and the subsequent nanosized film deposition of the same metal on its surface.…”

Section: Resultsmentioning

confidence: 99%

See 1 more Smart Citation

A New Approach to the Formation of Nanosized Gold and Beryllium Films by Ion-Beam Sputtering Deposition

et al. 2022

View full text Add to dashboard Cite

Thin films of beryllium and gold that are several tens of nanometers thick were obtained, for the first time, on silicon and quartz substrates by the ion-beam method with tenfold alternation of deposition and partial sputtering of the nanosized metal layer. Scanning electron and atomic force microscopy indicate the predominant lateral growth of nanosized metal layers along the substrate surface. Optical spectra indicate the suppression of the localized plasmon resonance. The growth of the film occurs under the influence of the high-energy component of the sputtered metal atoms’ flux. The main role in the formation of the nanosized metal film is played by the processes of the elastic collision of incident metal atoms with the atoms of a substrate and a growing metal film. Metal films that are obtained by the tenfold application of the deposition–sputtering of a nanoscale metal layer are characterized by stronger adhesion to the substrate and have better morphological, electrical, and optical characteristics than those that are obtained by means of direct single deposition.

show abstract

Section: Resultsmentioning

confidence: 99%

Section: Resultsmentioning

confidence: 99%

A New Approach to the Formation of Nanosized Gold and Beryllium Films by Ion-Beam Sputtering Deposition

et al. 2022

View full text Add to dashboard Cite

show abstract

“…Кроме того, при напылении обеспечивается высокая адгезия наносимых пленок к подложке, их однородность по толщине и постоянство химического состава. С другой стороны, малые скорости напыления материалов позволяют контролировать процесс их нанесения и проводить исследования как на начальных стадиях зарождения, так и при образовании сплошной пленки [3,[14][15][16][17].…”

unclassified

“…Внедренные атомы золота являются, с одной стороны, точечными дефектами в приповерхностном нарушенном слое подложки, а с другой стороны, служат дополнительными центрами кластерообразования. Они приводят к улучшению адгезии [14,16,17] из-за формирования дополнительных физических связей внедренный атом золота -осажденный адатом золота. При этом для предотвращения гранулирования пленок золота толщиной менее 2 нм производится удаление поверхностного слоя золота распылением ионами кислорода с энергией менее 300 эВ без удаления поверхности подложки, что позволяет сохранить внедренные в подложку атомы золота.…”

unclassified

Influence of the autoirradiation on nanosized gold layers formation by the ion-beam deposition

Galenko

Шарко

Новицкий

et al. 2021

Vescì Akademìì navuk Belarusì. Seryâ fizika-tehničnyh navuk

Self Cite

View full text Add to dashboard Cite

2–13 nm gold films were obtained by the method of ion-beam sputtering on silicon and quartz substrates. It is shown that the use of an additional operation of deposition followed by the sputtering of a gold layer of 2–3 nm thickness makes it possible to reduce the electrical resistance and surface roughness of the metal films, in comparison with similar films obtained without its use. The results of measuring the temperature coefficient of resistance of nanosized gold films on silicon substrates allowed us to conclude that the films deposited become continuous at a thickness of 6-8 nm. The results of optical measurements of 10 nm gold films, obtained on quartz substrates, showed that the reflection coefficient of electromagnetic radiation at a wavelength of 850 nm is 2.8 % higher than the corresponding coefficient for the same films obtained without using this operation, and is 83 %. An important role in the formation of nanoscale gold layers is played by the processes of self-irradiation of the growing layer of the high-energy component of the gold atoms flux. When using an additional operation of deposition/sputtering, high-energy gold atoms are implanted into the substrate to a depth of about 2 nm. On the one hand, these atoms are point defects in the surface damaged layer of the substrate; on the other hand, they serve as additional centers of cluster formation. This ensures strong adhesion of the metal layer to the substrate and, therefore, the gold films become continuous and more homogeneous in microstructure. The method of ion-beam deposition can be successfully applied to obtain high-quality conductive optically transparent nanosized gold films.

show abstract

Nickel thin films with bulk-like properties formed by the ion-beam sputtering – deposition cycles

Sharko,

Serokurova,

Novitskii

et al. 2024

Thin Solid Films

View full text Add to dashboard Cite

Magnetic properties of cobalt films at the initial stage of ion-beam deposition

Cited by 7 publications

References 6 publications

A New Approach to the Formation of Nanosized Gold and Beryllium Films by Ion-Beam Sputtering Deposition

A New Approach to the Formation of Nanosized Gold and Beryllium Films by Ion-Beam Sputtering Deposition

Influence of the autoirradiation on nanosized gold layers formation by the ion-beam deposition

Nickel thin films with bulk-like properties formed by the ion-beam sputtering – deposition cycles

Contact Info

Product

Resources

About