Magnetic properties of FeSiB thin films displaying stripe domains

Coı̈sson, M.; Vinai, F.; Tiberto, P.; Celegato, Federica

doi:10.1016/j.jmmm.2008.11.072

Cited by 74 publications

(37 citation statements)

References 8 publications

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“…The surface roughness of the nitrided surfaces (see Table 3), the γ N layer thicknesses (Table 3), and CrN precipitates that are distributed in the γ N layer for the samples nitrided for 6 and 20 h, are not taken into account. Experimental studies of magnetic materials in thin film form suggest in-plane to out-of-plane magnetic domain behavior as the thickness of the films increase [24]. Larger domain size and different domain morphology observed for the 6 and 20 h samples may be due to thicker γ N layers and due to the distribution of CrN particles within the γ N matrix.…”

Section: Magnetic Behaviormentioning

confidence: 93%

See 1 more Smart Citation

Magnetic layer formation on plasma nitrided CoCrMo alloy

Öztürk¹,

Okur²,

Pichon³

et al. 2011

Surface and Coatings Technology

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Section: Magnetic Behaviormentioning

confidence: 93%

“…The patterns observed here are typical of the vertical domains found in a number of materials in thin film form. According to literature [23,24], a stripe domain structure is a clear evidence for a significant magnetization vector directed off the sample surface.…”

Section: Magnetic Behaviormentioning

confidence: 99%

Magnetic layer formation on plasma nitrided CoCrMo alloy

Öztürk¹,

Okur²,

Pichon³

et al. 2011

Surface and Coatings Technology

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“…The films with a small thickness are satisfactorily soft, but the growth of thicker films is affected by the development of a columnar structure that defines an easy magnetization axis in the direction perpendicular to the plane of the sample. In this situation, the sample enters what is called a transcritical state [26], observed also in amorphous films [27], which ruins the magnetic softness and results severely detrimental for MI performance, since MI requires both magnetic softness and increased sample thickness. Therefore, it is very important to determine the optimum preparation conditions, as well as the limiting Py single-layer thickness that can be reached before entering the transcritical state.…”

Section: Thin Film MI Materialsmentioning

confidence: 99%

Thin-Film Magneto-Impedance Sensors

Garcı́a-Arribas¹,

Férnández²,

Cos³

2017

Magnetic Sensors - Development Trends and Applications

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We review the state-of-the-art of thin films displaying the magneto-impedance (MI) effect, with focus on the aspects that are relevant to the successful design and operation of thin film-based magnetic sensors. After a brief introduction of the MI effect, the materials and geometries that maximize the performance, together with the measurement procedure for their characterization, are exposed. A nonexhaustive survey of applications is included, mostly with the aim of displaying the capabilities of thin film structures in the field of magnetic sensing, and the variety of topics covered by them. A special emphasis is made on some concepts that are not commonly treated in the literature, such as the influence of the measuring circuit on the magneto-impedance ratio, the geometry optimization by means of numerical simulation by finite element methods, or noise measurements on thin films. Additionally, a brief description of the patterning procedure by photolithography is included, since the major advantage of thin film sensors over other types of magneto-impedance materials as ribbons or wires is the possibility of patterning the sensible element in micrometric shapes, and most of all, their easy integration with the interface microelectronic circuitry.

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“…The presence of stress can be avoided through the optimization of the deposition parameters and the thermal treatments at temperatures lower than the crystallization one [12,13]. The fingerprint of stress presence is the transcritical shape in the hysteresis loops [14,15] as shown in Fig.6a and a magnetization organized in weak stripe domains [14,16] as reported in Fig.5b.…”

Section: Magnetic Characterizationmentioning

confidence: 99%

Hall current sensor IC with integrated Co-based alloy thin film magnetic concentrator

Palumbo

Marchesi

Chiesi

et al. 2013

EPJ Web of Conferences

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Abstract. This work deals with a cobalt-based alloy thin film magnetic concentrator (MC) which is fully integrated on a Hall sensor integrated circuit (IC) developed in the 0.35 µm Bipolar CMOS DMOS (BCD) technology on 8" silicon wafer. An amorphous magnetic film with a thickness of 1µm, coercitive field H c <10A/m and saturation magnetization (µ 0 M S ) of 0.45T has been obtained with a sputtering process. The Hall sensor IC has shown sensitivity to magnetic field at room temperature of 240V/AT without concentrator and 2550V/AT with concentrator, gaining a factor of 10.5. A current sensor demonstrator has been realized showing linear response in the range -50 to 50A.

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Magnetic properties of FeSiB thin films displaying stripe domains

Cited by 74 publications

References 8 publications

Magnetic layer formation on plasma nitrided CoCrMo alloy

Magnetic layer formation on plasma nitrided CoCrMo alloy

Thin-Film Magneto-Impedance Sensors

Hall current sensor IC with integrated Co-based alloy thin film magnetic concentrator

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