Magnetic Properties of Reactive Co-Sputtered NiFe-Oxide Samples

A dual beam magneto-optical setup employing a dual axis photoelastic modulator (PEM) and an intensity-stabilized laser was designed and constructed. The beam transmitted through or reflected of the sample is split by a Wollaston prism into two orthogonal high-quality linearly polarized beams. Two photodetectors are used to measure the DC and 2ω components of each beam’s intensity. Theoretical calculations using Jones matrices show that the difference between the 2ω signals, i.e., ΔI2ω, is linearly proportional to the Kerr or Faraday rotation of the sample. Different from I2ω of a traditional single beam setup, the ΔI2ω does not contain an offset caused by the Fabry Perot interference in the PEM’s optical head, making the setup less sensitive for small sample movements and laser drifts including intensity, wavelength, and beam direction drifts all originating from mainly temperature fluctuations in the lab.

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Electrical Characterization of Silicon — Nickel Iron Oxide Heterojunctions

Talbert

Cantrell

Talukder

et al. 2019

MRS Advances

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The electrical properties of Radio Frequency Sputtered NiFeO and NiO films deposited on n and p-type Silicon is investigated for two different oxygen flows. Rectifying properties for Ni0.8Fe0.2O1+ α on n-Si showed Iforward/Ireverse >10,000 for α>0 and Iforward/Ireverse >50 for α<0. Both types of devices have opposite forward biases. Results suggest that NiFeO sputtered at high oxygen flow is p-type. For NiO and NiFeO on p-Si no strong rectifying properties were observed. The specific contact resistivity of Pt/Ni0.9Fe0.1O1+ α (α>0) was estimated from the difference between the two and four-point probe resistances (0.0007 ± 0.0003 Ω cm2). Using density functional theory calculations, density of state and charge density plots were obtained for systems modelled after experiment, showing that states introduced by O vacancies in NiFeO are localized and prefer locations near Ni explaining the observed hysteresis effects in the IV curves of devices sputtered at low oxygen flow.

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Magnetic Properties of Reactive Co-Sputtered NiFe-Oxide Samples

Cited by 3 publications

References 10 publications

Modulation of the conductive behavior of NiO thin film deposited by HiPIMS through varying the O2 flow ratio

Modulation of the conductive behavior of NiO thin film deposited by HiPIMS through varying the O2 flow ratio

Dual beam modulated magneto-optical measurement setup

Electrical Characterization of Silicon — Nickel Iron Oxide Heterojunctions

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