“…The development and improvement of thin film growth techniques, namely molecular-beam epitaxy (MBE) [8], metalorganic chemical vapor deposition (MOCVD) [9], pulsed laser deposition (PLD) [10,11], and atomic layer deposition (ALD) [12,13], have enabled the experimental realization of several layered materials with specific characteristics, such as bilayer [14], trilayer [15,16], and multilayer [17][18][19][20][21] systems. Nevertheless, progress in experimental investigation of these materials becomes a slow and difficult process without detailed theoretical studies to guide.…”